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CNS User Info
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» Training Sign-up
   
   
   
   
CNS Training Events - Registration Page
 

Registration is currently open for the following training sessions:

select month:
Date TBD - you can pre-register for this training session
CNS staff will notify you when a date has been set.
Training - Focused Ion Beam (FIB/SEM) Training Waitlist -
Trainer: Andrew Magyar
A wait list for training on the new FEI FIB/SEM. This list is for users who are not currently trained on the Zeiss NVision 40.
  Time Max Attendees Available CNS Users ONLY
  99 99 Pre-Register!  
 
         
 
Wednesday, September 17th, 2014
Training - Advanced SPM (scanning Probe Micrscope) techniques - LISE-G12
Trainer: Jiangdong Deng
In this advanced SPM training session, some special techniques of SPM (mainly on Asylum-AFM system) will be introduced, including MFM, ORCA, nano-indentation, SPM-lithography and others. Before taking this training, user should pass the basic AFM training session, and have the access of Asylum-AFM.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:30 pm
2 1 Register!  
 
Training - Denton e-beam evaporator (EE-4) - LISE G07 (cleanroom); PVD Bay
Trainer: Ed Macomber
Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Ge, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 3:00 pm
(check links in confirmation email for documents)
5 2 Register!  
 
Training - FTIR microscopy -
Trainer: Arthur McClelland
Learn to use the Bruker Lumos FTIR microscope in ATR, transmission, or reflection mode
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 FULL Registration Closed  
 
Training - Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak 6M) (PL-3/5), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 FULL Registration Closed  
 
Training - Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Metrology for Nanofabrication-1 is NOT required to attend this part-2 training. Full independent access to the AFM (SPM-5) requires completion of part-1 basic imaging and operation demonstrated by staff followed by at least one individual user assisted session that serves as a user qualification on another day. AFM probes are provided for training; however users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 FULL Registration Closed  
 
Training - RIE-8 STS RIE Training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
The STS MPX/LPX RIE system is an Inductively Coupled Plasma Reactor that is used for Reactive Ion Etch. Using the ICP technology, this etch system is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity and low energy ion damage. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 15 to 30°C.

Attention: Only Si-based materials, including Si, a-Si, SiO2, and Si3N4, are allowed to be etched in this system. All other materials are forbidden.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:00 pm
4 1 Register!  
 
Training - SP-3 AJA sputtering system training – 3-gun system - CNS cleanroom (G-07) Dry Bay
Trainer: Ed Macomber
This training is for standard operating procedure of SP-3 sputtering system. The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with one RF and one DC gun. After an additional one-to-one training for target changes, the user can then change targets to fit their own schedule. After 4 uses (with no problems) users are given 24/7 access.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:00 pm - 4:00 pm
(check document links in confirmation email)
4 2 Register!  
 
Training - SU-8 photolithography process training - Meet in the Cleanroom at the photolithography bay (G07)
Trainer: Hao-Yu (Greg) Lin
Training on MJB4 contact aligner with focus on SU-8 photo resist process.
Please complete Wetbench + Chemical Safety Training before SU-8 process training.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 2 Register!  
 
Training - Wetbench + Chemical Safety Training - We meet OUTSIDE G-07 Gowning Area (YES, OUTSIDE, then we go UPSTAIRS)
Trainer: Mac Hathaway
Training for use of the CNS wetbenches, with special emphasis on chemical safety, with some process engineering and other select topics
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:30 pm
8 1 Register!  
 
         
 
Thursday, September 18th, 2014
Training - ALD-2 Arradiance GEMStar ALD and Pulsed CVD Training - LISE CNS Cleanroom (G07) Wet Processing Bay
Trainer: Philippe de Rouffignac
The GEMStar ALD and Pulsed CVD system from Arradiance Inc. a mid-temperature (160 - 375 C) deposition system that uses surface self limiting reactions in ALD mode and traditional CVD reactions to grow conducting metal nitride and pure metal films with good uniformity, conformality, and material purity.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:00 am
5 5 Register!  
 
Training - G06 CHEMICAL NANOTECHNOLOGY ROOM TRAINING - LISE G06
Trainer: Monica Zugravu
Safety features of the Chemical Nanotechnology room including the two ReynoldsTech wet benches will be presented.
Please be on time. I will wait for you 10 min. max. and then I will start the training inside G06. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 2:00 pm
6 2 Register!  
 
Training - Soft Lithography Training - G06
Trainer: Hao-Yu (Greg) Lin
Training includes PDMS process, KLA-Tencor profiler, UV flood exposure system, plasma prep II and wax printer
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 1:00 pm
2 1 Register!  
 
Training - X-ray MicroCT Training - LISE G27
Trainer: Fettah Kosar
Covers the basic training on the X-Tek HMXST225 X-ray imaging and computed tomography system, as well as a brief introduction to VGStudio Max 2.2 3D visualization and rendering software. For more information about our MicroCT system, please visit the instrument's webpage at:
http://www.cns.fas.harvard.edu/facilities/tool_detail.php?MID=151
PREREQUISITES - Prior to the training:
1) Complete the "CNS X-Ray Safety Requirements Form" and submit it to CNS Admin Office in LISE 306.
http://www.cns.fas.harvard.edu/users/Forms/FM004_r1_6_Pre-Training_Requirements_MicroCT.pdf
2) Study the "X-ray MicroCT Training Presentation".
http://www.cns.fas.harvard.edu/facilities/docs/X-ray%20MicroCT%20Training%20Presentation%20-%202013-03-19.pdf
3) Bring a paper copy of "SOP086 MicroCT Quick Guide".
http://www.cns.fas.harvard.edu/facilities/docs/SOP086_r7_4_X-Tek%20MicroCT%20Quick%20Guide.pdf
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:30 pm
Meet at the door of LISE G27
2 1 Register!  
 
         
 
Friday, September 19th, 2014
Training - JA Woollam Spectroscopic Ellipsometer - LISE-G07, metrology bay
Trainer: Jiangdong Deng
This trainng will cover the basic principle, operation procedure and data analysis (basic) of JAW spectro-ellipsometer.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
         
 
Monday, September 22nd, 2014
Training - Biomaterials Facility G05 room training - LISE G05
Trainer: Monica Zugravu
This training will provide the safety information, room orientation and basic guidelines for working in the Biological Materials Facility.
Please be on time. I will wait for you 10 min. max. and then I will start the training inside G05. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:00 pm
Turn right when you come out of the elevator and then it's around the corner.
3 2 Register!  
 
Training - Disco ADA-321 Automatic Dicing Saw Training Part 1-Basic Operation - LISE G06
Trainer: Jason Tresback
This training event will cover the basic operation of the Disco ADA-321 Automatic Dicing Saw (SW-1). The tool uses a rotating, ultra-thin (100-300 um Thick) diamond/resin composite blade, in a wet environment to cut materials such as silicon wafers, non-toxic semiconductors, glass sheets, quartz, sapphire, ceramics, etc. Your sample should be coating with a protective layer, such as photo resist to protect it from cutting water. Full tool access will require attending part 1-Basic operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day, AND completion of the LISE G06 Room Safety Training event. Please register for each event.
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 5:00 pm
3 1 Register!  
 
Training - Nanofabrication process discussion - LISE-G54 (JD's office)
Trainer: Jiangdong Deng
This is a free discussion with CNS staff and opens to any users who wants to get the advice and suggestion on their fabrication process in the cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
2 1 Register!  
 
Training - O2 Plasma Stripper system (RIE-5 and RIE-9) - LISE-G07, in the main cleanroom, metrology bay
Trainer: Jiangdong Deng
This training would cover the basic operation procedure of two O2 plasma strippers in the cleanroom .
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 4:30 pm
4 4 Register!  
 
Training - RIE-7 Unaxis RIE training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
Applications:
This tool will be dedicated to III-V compound semiconductor materials and diamond etchings.

Features:
ICP plasma generator
Load-lock
End point detector
Substrate temperature control unit
Available gases: HBr, Cl2, BCl3, CH4, H2, Ar, N2, O2
Sample size: 6” or smaller

Processes:
Etching processes have been developed for several III-V materials including GaAs, AlGaAs, InP, AlInAs-GaInAs multilayer, and others. Several mask materials were used, mainly include Si3N4, SU-8, and PMMA. In general, the etching processes demonstrated smooth & clean etched surface, vertical side wall, high etch rate, and good selectivity to mask materials. For detailed process information and etching results, please go to CNS website/facilities/nanofabrication facilities/process information.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 FULL Registration Closed  
 
Training - RIE-7 Unaxis RIE training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
Applications:
This tool will be dedicated to III-V compound semiconductor materials and diamond etchings.

Features:
ICP plasma generator
Load-lock
End point detector
Substrate temperature control unit
Available gases: HBr, Cl2, BCl3, CH4, H2, Ar, N2, O2
Sample size: 6” or smaller

Processes:
Etching processes have been developed for several III-V materials including GaAs, AlGaAs, InP, AlInAs-GaInAs multilayer, and others. Several mask materials were used, mainly include Si3N4, SU-8, and PMMA. In general, the etching processes demonstrated smooth & clean etched surface, vertical side wall, high etch rate, and good selectivity to mask materials. For detailed process information and etching results, please go to CNS website/facilities/nanofabrication facilities/process information.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 2 Register!  
 
Training - VersaLaser training - LISE G06
Trainer: Monica Zugravu
This training will provide basic instructions and a demo on using the cutting and engraving system VersaLaser 3.50
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 3:30 pm
3 2 Register!  
 
         
 
Tuesday, September 23rd, 2014
Training - Basic Confocal Microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Olympus FV300 laser scanning confocal microscope
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:30 am
3 3 Register!  
 
Training - Cambridge Nanotech Atomic Layer Deposition Training - Gowning area - G-07 Cleanroom (Meet in GOWNING AREA)
Trainer: Mac Hathaway
Training on the ALD oxide system

For Metals and Nitrides, you will need to use the Gemstar - ALD-2
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30 pm - 3:30 pm
4 1 Register!  
 
Training - CVD - 2 Nexx PECVD System - Dry Processing Bay - LISE Cleanroom
Trainer: Philippe de Rouffignac
NEXX CVD-2 is an ECR (electron cyclotron resonance) plasma-enhanced CVD system. ECR technology produces high plasma density and low ion energy at low chamber pressure, allowing the deposition of high-quality films at relatively low temperature. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled in < 120 ºC range. The entire system is fully computer controlled. Available gases are He, Ar, N2, O2, 3% SiH4 and Ar. Films that can be deposited include SiO2, SiN4 and a-Si thin films.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30 pm - 4:00 pm
Established SiO2, Si3N4, low-stress Si3N4, and amorphous Si film deposition conditions and results are listed in the Nexx PECVD Logbook.
3 1 Register!  
 
Training - CVD-3 STS PECVD - cleanroom, dry-processing bay
Trainer: Philippe de Rouffignac
The STS PECVD system utilizes two RF power supplies (LF and HF) to produce a medium density plasma that produces silicon based films depending on the process gases. The system has optimized recipes for SiO2 (at 190 and 300C), Si3N4 (at 190 and 300C), SiON, and a:Si (doped P, B and undoped).
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 2:30 pm
4 1 Register!  
 
Training - HAR-050 Sputter Coater Training - LISE B15A
Trainer: Andrew Magyar
Learn to use the sputter coater in the imaging sample prep room. This tool is primarily used to coat samples with thin (10s of nanometers) films of metals like gold or platinum/palladium to make the samples conductive for SEM.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 10:30 am
4 1 Register!  
 
Training - Heidelberg uPG501 Direct Write Lithography Training - Meet in the metrology bay of the cleanroom.
Trainer: Guixiong Zhong
Training on the Heidelberg uPG501 direct-write lithography system. This tool can be used to expose positive and negative photoresist without the need for a photomask; it can also be used to write photomasks. The tool has 2 micron or better feature resolution, 1 micron alignment accuracy. The prerequisite for this training is the photolithography training.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  11:00 am - 12:00 pm
4 4 Register!  
 
Training - Introduction To Photolithography (Headway Spinner and Contact Aligner Training) - Photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
In This training session we will cover wafer cleaning and resist coating , Soft bake, Exposing and developing a Photolithography pattern

Training will cover use the Headway Spinner benches, the MJB4 contact aligner and the Developer Bench, with a focus on positive resist processes. Wet bench training is required for this session.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
Training - Introduction to TEM using the JEOL 2100 2 part session part 1 September 23rd part 2 september 24th both 9:00 am-12:30 pm - B15C
Trainer: Adam Graham
In this training session you will learn how to use the JEOL 2100. This includes start up, Alignment, High res imaging and shut down. Access to the TEM is granted after completion of both session as well as an independant certification.
  Time Max Attendees Available CNS Users ONLY
  9:00 am - 3:00 pm
This is a 2 part session. Both required and both from 9-12:30 spetember 23rd and 24th.
4 1 Register!  
 
Training - LISE B15A Imaging Sample Prep Room Safety Training - LISE B15A
Trainer: Andrew Magyar
This safety training is required to enter the sample prep room. A brief overview of the tools available in B15A will also be provided.
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:00 am
8 6 Register!  
 
Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exceptions are NNIN/C or Remote Users Only. This training can be taken prior to turning in enrollment paperwork.
  Time Max Attendees Available Open Event!
  9:30 am - 12:00 pm
9:30 am - 12:00 pm. For a map and driving directions to the LISE Building, please see the URL: http://www.cns.fas.harvard.edu/contact/index.php
15 11 Register!  
 
Training - LPCVD and APCVD Training - Dry-Processing Bay
Trainer: Philippe de Rouffignac
Training for all 6 furnaces of the Tystar System
(SiNx, Poly, TEOS, Oxidation, non-metal anneal, metal anneal) CVD 5,6,7,9,10,11
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:30 am
4 1 Register!  
 
Training - Nanofabrication Cleanroom Orientation - Meet in front of G 07 Promptly
Trainer: John Tsakirgis
To understand the gowning protocols, chemical usage and toxic gas evacuation here at CNS.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
PLease be on time..
5 FULL Registration Closed  
 
Training - Rapid Thermal Processing 2 - Meet in front of PVD Bay
Trainer: John Tsakirgis
To understand the operation and safety of RTP2 processing at CNS.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:00 am
Please be on time
3 2 Register!  
 
Training - RCA Clean station - meet inside cleanroom in front of wet bay
Trainer: John Tsakirgis
To understand the operation and safety pof the RCA Station at CNS
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
Please be prompt and bring cleanroom notebook
5 5 Register!  
 
Training - Soft Materials Cleanroom training - Meet in front of G07
Trainer: Monica Zugravu
This training will provide the safety requirements and equipment overview inside the Soft Materials Cleanroom and is required for accessing this facility.
  Time Max Attendees Available CNS Users ONLY
  9:30 am - 10:30 am
4 3 Register!  
 
Training - SP-3 AJA sputtering system training for 3-gun system - CNS cleanroom (G-07) Dry Bay
Trainer: Ed Macomber
This training is for standard operating procedure of SP-3 sputtering system. The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with one RF and one DC gun. After an additional one-to-one training for target changes, the user can then change targets to fit their own schedule. After 3 uses (with no problems) users are given 24/7 access.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  11:00 am - 12:00 pm
(check document links in confirmation email)
4 3 Register!  
 
Training - Witec confocal Raman Microscope training - LISE-G12
Trainer: Jiangdong Deng
In this training, we will go through the basic operation procedure of WiTec Raman system. After this training, you will learn how to check the system, to get the single Raman spectrum, to build Raman image. This course is required for advanced WiTec NSOM/AFM/Raman training
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 2 Register!  
 
         
 
Wednesday, September 24th, 2014
Training - 3D printing with the Makerbot - LISE G06
Trainer: Arthur McClelland
Learn to use the Makerbot 3D printer to make objects in PLA, ABS, or PS
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:00 am
3 2 Register!  
 
Training - Advanced SPM (scanning Probe Micrscope) techniques - LISE-G12
Trainer: Jiangdong Deng
In this advanced SPM training session, some special techniques of SPM (mainly on Asylum-AFM system) will be introduced, including MFM, ORCA, nano-indentation, SPM-lithography and others. Before taking this training, user should pass the basic AFM training session, and have the access of Asylum-AFM.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:30 pm
2 2 Register!  
 
Training - FTIR microscopy -
Trainer: Arthur McClelland
Learn to use the Bruker Lumos FTIR microscope in ATR, transmission, or reflection mode
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 3 Register!  
 
Seminar - Introduction to Micro Spot XRF for trace elemental analysis of nanoparticles, thin films, and mettalomics - LISE Room 303
Trainer: Hao-Yu (Greg) Lin
Energy Dispersive X-ray Fluorescence Spectroscopy is a widely accepted technique in the research areas of geology, metals, and petrochemical analysis. With the advent of Micro Spot X-ray tubes and optics, ED-XRF based techniques can now be used in areas that require ultra low detection limits and small spot analysis. In this presentation, Mike Beauchaine will discuss the use of TXRF (Total Reflection X-ray Fluorescence) for trace elemental analysis using only micrograms of sample for nanoparticles and biological research. He will also present research within materials analysis using small spot Micro XRF spectroscopy. Lastly, Mike Beauchaine will introduce you to the brand new large scale Micro XRF technology for the analysis of hidden paintings under famous works of art.
  Time Max Attendees Available Open Event!
  12:00 pm - 5:00 pm
TXRF tool demonstration 2 PM to 5 PM @ G27
40 34 Register!  
 
Training - Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak 6M) (PL-3/5), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 2 Register!  
 
Training - RIE-1 SouthBay Training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
A parallel plate low density plasma reactor with available gases of SF6, CF4, CHF3, O2, and Ar. This RIE is able to etch Si, SiO2, Si3N4, W, Ti, etc.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:00 pm - 4:00 pm
4 3 Register!  
 
Training - SU-8 photolithography process training - Meet in the Cleanroom at the photolithography bay (G07)
Trainer: Hao-Yu (Greg) Lin
Training on MJB4 contact aligner with focus on SU-8 photo resist process.
Please complete Wetbench + Chemical Safety Training before SU-8 process training.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 2 Register!  
 
Training - Training on the Heidelberg DWL66 Mask writer Part-1 - Ebeam bay
Trainer: Amehayesus Gebreyohannes
this is a the first part of a two-part training, a group session covering the operation of the tool. The second, certification training will be conducted one-on-one, and scheduled after the completion of part 1. Users will bring their own mask job(s) to write in part 2. Users will be required to use the DWL66 at least once every 6 months to stay certified, if the tool is not used for greater than six months another part 2 certification session will need to be conducted.

Please see the tool webpage for more information on the capabilities of this tool.

Use of the DWL66 is for producing masks only; for direct-write lithography of other objects, please look into training on the Heidelberg uPG501

Prerequisite: Wetbench + Chemical Safety Training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
3 3 Register!  
 
Training - Wetbench + Chemical Safety Training - We meet OUTSIDE G-07 Gowning Area (YES, OUTSIDE, then we go UPSTAIRS)
Trainer: Mac Hathaway
Training for use of the CNS wetbenches, with special emphasis on chemical safety, with some process engineering and other select topics
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:30 pm
8 7 Register!  
 
Training - XeF2 Etcher training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
Isotropic etching of Si.
  Time Max Attendees Available CNS Users ONLY
  4:00 pm - 4:30 pm
4 2 Register!  
 
         
 
Thursday, September 25th, 2014
Training - Atomic Force Microscopy Part-2 Individual User Qualification (Asylum MFP3D -AFM) - LISE G12
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:00 pm
3 2 Register!  
 
Training - DelsaNano C Training - Particle Size - LISE G06
Trainer: Fettah Kosar
Beckman Coulter DelsaNano C is a user-friendly dynamic light scattering instrument, which can analyze size as well as zeta potential of nanoparticles (about 1nm - 6um). This training covers the size measurement portion. Zeta potential training can be arranged as a one-on-one assisted session after taking this first training. For more information about our DelsaNano C, please visit the instrument's webpage at:
http://www.cns.fas.harvard.edu/facilities/tool.php?MID=181
PREREQUISITES: "LISE G06 Room Training" and "CNS Nanoparticle Safety Requirements Form" must be completed prior to attending this training.
http://www.cns.fas.harvard.edu/users/Forms/FM008_r1_3_Pre-Training_Requirements_for_Working_with_Nanoparticles.pdf
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:30 pm
Meet at the entrance of LISE G06.
2 2 Register!  
 
Training - Finetech Flip Chip Bonder - G12
Trainer: Guixiong Zhong
Basic training for the Finetech Flip chip bonder in room G12. Fineplacer Lambda Manual Sub-Micron Flip-Chip Bonder provides accurate alignment and placement of a device chip to a substrate as an advanced form of chip interconnection.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 3:30 pm
4 4 Register!  
 
Training - FTIR Spectroscopy Training - LISE G04
Trainer: Arthur McClelland
Learn to use the Perkin Elmer FTIR for analysis of solids, liquids, or powders
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 2 Register!  
 
Training - G06 CHEMICAL NANOTECHNOLOGY ROOM TRAINING - LISE G06
Trainer: Monica Zugravu
Safety features of the Chemical Nanotechnology room including the two ReynoldsTech wet benches will be presented.
Please be on time. I will wait for you 10 min. max. and then I will start the training inside G06. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 2:00 pm
6 6 Register!  
 
Training - Leica DM IRB Live Cell Microscope in G05 - LISE G05
Trainer: Monica Zugravu
Learn to use the live cell microscope in G05 for time lapse acquisition with phase contrast or fluorescence.
  Time Max Attendees Available CNS Users ONLY
  3:00 pm - 5:00 pm
2 2 Register!  
 
Training - LSD-100 Scriber/Cleaver for III-V materials - G12
Trainer: Guixiong Zhong
Basic training to use the scriber/cleaver for III-V materials.
  Time Max Attendees Available CNS Users ONLY
  4:30 pm - 5:00 pm
4 4 Register!  
 
Training - Nanofabrication Cleanroom Orientation - Please meet in front of G 07 promptly
Trainer: John Tsakirgis
To be comfortable with gowning protocol, chemical safety and toxic gas evacuation.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
please be prompty
5 FULL Registration Closed  
 
Training - RIE-6 Nexx ECR RIE Training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
NEXX RIE-6 is an ECR (electron cyclotron resonance) RIE system. ECR technology produces high plasma density and low ion energy at low chamber pressure and results in low plasma damage and high etch rate. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled < 120 ºC. The entire system is fully computer controlled. Available gases on this tool include He, Ar, O2, CF4, CHF3, Cl2, CH4, and H2. Except polymer stripping, all other materials’ dry etchings are allowed.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 4 Register!  
 
Training - Sharon TE-3, 4, and 5 thermal evaporator training - LISE G07 (CNS Cleanroom), PVD Bay
Trainer: Ed Macomber
Training on TE-3, 4 and 5 for thermal evaporation of metals is covered. We meet at the system in the CNS cleanroom PVD bay. Training takes about 2 hours. Venting, loading a sample, pumping and evaporation are performed and explained. For these TE systems, users supply their own deposition materials and boats (sources). CNS supplies the materials for training. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, etc.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30 pm - 4:30 pm
(Please review document links in email confirmation)
4 FULL Registration Closed  
 
Training - UV-VIS spectrometer - LISE G04
Trainer: Arthur McClelland
Learn to use the Cary 60 UV/VIS spectrometer in transmission and reflection mode.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:00 am
3 3 Register!  
 
Training - Wire bonder training -
Trainer: Guixiong Zhong
Basic training to use the wire bonder. This wedge bonder is configured for bonding aluminum wire (.001") to gold.
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 4:30 pm
4 4 Register!  
 
         
 
Friday, September 26th, 2014
Training - Advanced training on WiTec NSOM/AFM/Raman system - LISE-G12
Trainer: Jiangdong Deng
This is an advanced training course on the WiTec NSOM/AFM/Raman microscope system. Based on user's request, we will go deeper into this system and explore the capability of near-field optical imaging, AFM, and more. Before take this training, WiTec Raman training is required.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
2 2 Register!  
 
Training - JA Woollam Spectroscopic Ellipsometer - LISE-G07, metrology bay
Trainer: Jiangdong Deng
This trainng will cover the basic principle, operation procedure and data analysis (basic) of JAW spectro-ellipsometer.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 4 Register!  
 
Training - Optical Microscope Training in Nanofabrication Cleanroom (Visible and IR) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
This training event will cover basic operations of the various optical microscopes and digital cameras available inside the Nanofabrication Cleanroom. There are five independent systems consisting of Nikon L200, Nikon Optiphot 150 and Optiphot 66, and two Olympus BX51s. These are equipped with two Nikon CCD cameras, a Motic camera, an Xfinity 1 CCD camera, and a Q-imaging IR camera. The systems contain 2.5x to 150x objectives, BF/DF modes, reflective/transmission modes, and the Optiphot 150 has a NWL-641 Auto Loader for 4 and 6” wafer cassettes.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:00 pm - 4:00 pm
4 4 Register!  
 
Training - SEM training part 1 - LISE 303
Trainer: Dave Lange
Introduction to using the SEM including basic background and detectors available on the SEMs at CNS.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:30 pm
15 11 Register!  
 
         
 
Monday, September 29th, 2014
Training - Biomaterials Facility G05 room training - LISE G05
Trainer: Monica Zugravu
This training will provide the safety information, room orientation and basic guidelines for working in the Biological Materials Facility.
Please be on time. I will wait for you 10 min. max. and then I will start the training inside G05. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:00 pm
Turn right when you come out of the elevator and then it's around the corner.
3 3 Register!  
 
Training - Electrical Characterization Part 1- Van der Pauw Resistivity and Hall Measurement System (MET-5) - LISE G27
Trainer: Jason Tresback
This training event will cover a basic introduction to electrical property measurements of semiconducting materials at CNS. Sample sizes up to 20x20 mm, containing highly ohmic contact electrodes that form a square with 5-20 mm center to center spacing are recommended for using this Hall measurement system. Room temperature operation of the Van der Pauw resistivity and Hall measurement system (MET-5) will be demonstrated and contact electrode recommendations will be discussed. Temperature dependent measurements in the range of 100K to 700K can only be made by staff assisted use. Email (jtresback@cns.fas.harvard.edu) if you have any questions, and we meet in the hallway outside LISE G27.
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 3:30 pm
3 3 Register!  
 
Training - FESEM training part 2 (Prerequisite SEM training part 1) - B20B
Trainer: Dave Lange
Basic training to use the Supra and Ultra FESEMs.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 5:00 pm
4 FULL Registration Closed  
 
Training - Low Temperature (LT) 4-Point Probe Station Training - LISE G27
Trainer: Jason Tresback
This training event will begin by demonstrating basic operations of the Low Temperature (LT) 4-pt Probe Station for electrical characterization measurements as a function of temperature from 80K to 450K using liquid N2. The system is currently configured with four BeCu or Tungsten blade probes (10 and 25um radius). Liquid helium can be supplied by users for measurements ranging from 1.5K to 450K. Full tool access will require at least one user assisted session to be scheduled on another day. Please email jtresback@cns.fas.harvard.edu if you have any questions. We meet in the hallway outside LISE G27
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
3 3 Register!  
 
Training - MA6 Mask Aligner Training - photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
Training on the MA6 mask aligner. Headway spinner training is a prerequisite for this event, as is training on and familiarity with the MJB4 mask aligner, or another MA6 mask aligner.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
Training - Nanofabrication process discussion - LISE-G54 (JD's office)
Trainer: Jiangdong Deng
This is a free discussion with CNS staff and opens to any users who wants to get the advice and suggestion on their fabrication process in the cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
2 2 Register!  
 
Training - O2 Plasma Stripper system (RIE-5 and RIE-9) - LISE-G07, in the main cleanroom, metrology bay
Trainer: Jiangdong Deng
This training would cover the basic operation procedure of two O2 plasma strippers in the cleanroom .
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 4:30 pm
4 4 Register!  
 
Training - RIE-7 Unaxis RIE training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
Applications:
This tool will be dedicated to III-V compound semiconductor materials and diamond etchings.

Features:
ICP plasma generator
Load-lock
End point detector
Substrate temperature control unit
Available gases: HBr, Cl2, BCl3, CH4, H2, Ar, N2, O2
Sample size: 6” or smaller

Processes:
Etching processes have been developed for several III-V materials including GaAs, AlGaAs, InP, AlInAs-GaInAs multilayer, and others. Several mask materials were used, mainly include Si3N4, SU-8, and PMMA. In general, the etching processes demonstrated smooth & clean etched surface, vertical side wall, high etch rate, and good selectivity to mask materials. For detailed process information and etching results, please go to CNS website/facilities/nanofabrication facilities/process information.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 3 Register!  
 
Training - Sharon EE-3 e-beam evaporator training - We meet in the cleanroom PVD bay (LISE G07)
Trainer: Ed Macomber
E-beam evaporation in EE-3 is covered; EE-3 can deposit 19 different materials (metals). We will cover venting, loading the sample, pumping down (vacuum system) and the actual deposition. Plan on ~2 hr for this training. We meet in the cleanroom PVD bay (LISE G07).
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 3:00 pm
(Please review document links in email confirmation)
4 3 Register!  
 
Training - Thin Film Stress Measurement Training (FLX-2320-S) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
The FLX-2320-S determines stress by measuring the curvature change of pre- and post- film deposition. It can measure film stress from -65ºC to 500ºC at a heating rate up to 30ºC/min. Stress variation with temperature is able to be used to characterize film properties, such as moisture concentration, phase changes, thermal expansion, volume changes, and plastic deformations.

Other characteristics of the instrument include:
• Dual wave lengths
• Calculation of biaxial modules of elasticity, linear expansion
coefficient, stress uniformity and file subtraction
• Calculation of water diffusion coefficient
• 2-D and 3-D view of wafer topography
• Wafer size: 30 - 200 mm
• Measurement temperature: from -65ºC to 500ºC
• PC base controller
• Speed: 5 sec for 150 mm wafer
• Minimum scan step: 0.02 mm
• Maximum points per scan: 1250
  Time Max Attendees Available LISE Cleanroom Users ONLY
  4:00 pm - 5:00 pm
4 2 Register!  
 
         
 
Tuesday, September 30th, 2014
Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day. Please register for each event and meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 3 Register!  
 
Training - Basic Confocal Microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Olympus FV300 laser scanning confocal microscope
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:30 am
3 3 Register!  
 
Training - Contact Angle and Surface Tension Measurement System Training - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
The FTA100 series contact angle and surface tension measurement system uses video-based software to analyze drop shape without operator error. The manual stage can accommodate up to 200mm wafers and liquid can be dispensed with a fixed volume using syringe pipette.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  4:00 pm - 5:00 pm
3 3 Register!  
 
Training - FESEM training part 2 (Prerequisite SEM training part 1) - B20B
Trainer: Dave Lange
Basic training to use the Supra and Ultra FESEMs.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 5:00 pm
4 2 Register!  
 
Training - Introduction To Photolithography (Headway Spinner and Contact Aligner Training) - Photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
In This training session we will cover wafer cleaning and resist coating , Soft bake, Exposing and developing a Photolithography pattern

Training will cover use the Headway Spinner benches, the MJB4 contact aligner and the Developer Bench, with a focus on positive resist processes. Wet bench training is required for this session.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 3 Register!  
 
Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exceptions are NNIN/C or Remote Users Only. This training can be taken prior to turning in enrollment paperwork.
  Time Max Attendees Available Open Event!
  9:30 am - 12:00 pm
9:30 am - 12:00 pm. For a map and driving directions to the LISE Building, please see the URL: http://www.cns.fas.harvard.edu/contact/index.php
15 15 Register!  
 
Training - Nanofabrication Cleanroom Orientation - Meet in front of G 07 Promptly
Trainer: John Tsakirgis
To understand the gowning protocols, chemical usage and toxic gas evacuation here at CNS.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
PLease be on time..
5 3 Register!  
 
Training - OL 770-LED Test and Measurement System Training - LISE G27
Trainer: Jason Tresback
The OL 770-LED Test and Measurement System (MET-13) is a high-speed, CCD-based spectro-radiometer that can be used to measure 2-pin/wire electroluminescent devices to determine total radiant flux, total luminous and spectral flux, total power, dominant wavelength, spectral purity, correlated color temperature, peak wavelength, color rendering index, and chromaticity. There is currently one standard LED holder and K2400 source meter to provide constant current or voltage (input power) and measure total light output power. We meet outside LISE G27 in hallway
  Time Max Attendees Available CNS Users ONLY
  3:00 pm - 4:00 pm
3 3 Register!  
 
Training - Plate reader training - LISE G05
Trainer: Monica Zugravu
This plate reader supports top and bottom fluorescence intensity, UV-visible absorbance and high performance luminescence detection in a variety of applications, such as: cell viability, growth, toxicity, ELISA, caspase and DNA assays. Basic operation principles and data analysis and export will be shown.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 1:30 pm
3 3 Register!  
 
Training - Rapid Thermal Processing 2 - Meet in front of PVD Bay
Trainer: John Tsakirgis
To understand the operation and safety of RTP2 processing at CNS.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:00 am
Please be on time
3 3 Register!  
 
Training - RCA Clean station - meet inside cleanroom in front of wet bay
Trainer: John Tsakirgis
To understand the operation and safety pof the RCA Station at CNS
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
Please be prompt and bring cleanroom notebook
5 5 Register!  
 
Training - RIE-10 SPTS Rapier DRIE - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
The SPTS’s Rapier system etches Si using Bosch switched processing for vertical profiles as well as non-switched processing for tapered profiles. The system is equipped with dual plasma sources with independently controlled primary and secondary decoupled plasma zones, with independent dual gas inlets; which results in high etch rate, good uniformity, and less tilting around wafer edge. The Electro-Static Clamping Chuck enables good wafer clamping, less wafer bowing compared with mechanical clamping, and wafer-less chamber cleaning. The attached AMS chiller can control the chuck temperature from -20°C to + 40°C and the Claritas end point detector can minimize the micro-trenches of SOI wafer etch as well as control the pre-etch and the post-etch cleaning.

Application

• Si etch solely
• High aspect ratio etch: 5 – 50
• Deep etch: 5µm – through Si wafer etch
• Broad features: from nano- to mm- scales in lateral dimension
• Side wall roughness (scallop depth): 6nm – 700nm
• Only resists and SiO2 or Si3N4 allowed as etching mask
• Handle samples ≤ 6”
• Absolutely no-metal mask or metal stop layer
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 4:00 pm
4 3 Register!  
 
Training - Soft Materials Cleanroom training - Meet in front of G07
Trainer: Monica Zugravu
This training will provide the safety requirements and equipment overview inside the Soft Materials Cleanroom and is required for accessing this facility.
  Time Max Attendees Available CNS Users ONLY
  9:30 am - 10:30 am
4 4 Register!  
 
Training - Thermo Scientific K-Alpha XPS Training - G27
Trainer: Hao-Yu (Greg) Lin
Training on the new Thermo XPS system.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 1:00 pm
4 FULL Registration Closed  
 
Training - Witec confocal Raman Microscope training - LISE-G12
Trainer: Jiangdong Deng
In this training, we will go through the basic operation procedure of WiTec Raman system. After this training, you will learn how to check the system, to get the single Raman spectrum, to build Raman image. This course is required for advanced WiTec NSOM/AFM/Raman training
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
         
 
 

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09/24/14
CNS Special Event: "Introduction to Micro Spot XRF for Trace Elemental Analysis of Nanoparticles, Thin Films, and Mettalomics"

Free Trainings Announced for new Plate Reader in G05 Biomaterials Lab

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