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CNS Training Events - Registration Page
 

Registration is currently open for the following training sessions:

select month:
Monday, December 22nd, 2014
Training - Karl Suss MA6 and EVG 620 Mask Aligner Training - photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
Training on the MA6 and EVG 620 mask aligner.Since this training is designed for users with basic knowhow of photolithography and Mask aligners, we’ll jump right in to advantages, advances and operation of the two mask aligners

Prerequisite: Introduction To Photolithography and training on and familiarity with the MJB4 or another MA6 mask aligner
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 1 Register!  
 
Training - Nanofabrication process discussion - LISE-G54 (JD's office)
Trainer: Jiangdong Deng
This is a free discussion with CNS staff and opens to any users who wants to get the advice and suggestion on their fabrication process in the cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
2 1 Register!  
 
Training - RIE-7 Unaxis RIE Training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
Applications:
This tool will be dedicated to III-V compound semiconductor materials and diamond etchings.

Features:
ICP plasma generator
Load-lock
End point detector
Substrate temperature control unit
Available gases: HBr, Cl2, BCl3, CH4, H2, Ar, N2, O2
Sample size: 6” or smaller

Processes:
Etching processes have been developed for several III-V materials including GaAs, AlGaAs, InP, AlInAs-GaInAs multilayer, and others. Several mask materials were used, mainly include Si3N4, SU-8, and PMMA. In general, the etching processes demonstrated smooth & clean etched surface, vertical side wall, high etch rate, and good selectivity to mask materials. For detailed process information and etching results, please go to CNS website/facilities/nanofabrication facilities/process information.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 2 Register!  
 
         
 
Tuesday, December 23rd, 2014
Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day. Please register for each event and meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 FULL Registration Closed  
 
Training - Electrical Characterization- Van der Pauw Resistivity and Hall Measurement System (MET-5) - LISE G27
Trainer: Jason Tresback
This training event will cover a basic introduction to electrical property measurements of semiconducting materials at CNS. Sample sizes up to 20x20 mm, containing highly ohmic contact electrodes that form a square with 5-20 mm center to center spacing are recommended for using this Hall measurement system. Room temperature operation of the Van der Pauw resistivity and Hall measurement system (MET-5) will be demonstrated and contact electrode recommendations will be discussed. Temperature dependent measurements in the range of 100K to 700K can only be made by staff assisted use. Email (jtresback@cns.fas.harvard.edu) if you have any questions, and we meet in the hallway outside LISE G27.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 3:00 pm
3 2 Register!  
 
Training - Low Temperature (LT) 4-Point Probe Station Training - LISE G27
Trainer: Jason Tresback
This training event will begin by demonstrating basic operations of the Low Temperature (LT) 4-pt Probe Station for electrical characterization measurements as a function of temperature from 80K to 450K using liquid N2. The system is currently configured with four BeCu or Tungsten blade probes (10 and 25 um radius). Liquid helium can be supplied by users for measurements ranging from 1.5K to 450K. Full tool access will require at least one user assisted session to be scheduled on another day. Please email jtresback@cns.fas.harvard.edu if you have any questions. We meet in the hallway outside LISE G27
  Time Max Attendees Available CNS Users ONLY
  3:00 pm - 5:00 pm
3 2 Register!  
 
Training - Nanofabrication Cleanroom Orientation - Meet in front of G 07 Promptly
Trainer: John Tsakirgis
To understand the gowning protocols, chemical usage and toxic gas evacuation here at CNS.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
PLease be on time..
5 3 Register!  
 
Training - Rapid Thermal Processing 2 - Meet in front of PVD Bay
Trainer: John Tsakirgis
To understand the operation and safety of RTP2 processing at CNS.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:00 am
Please be on time
3 1 Register!  
 
         
 
Wednesday, December 24th, 2014
Training - Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE-G07 (cleanroom-metrology bay)
Trainer: Jason Tresback
This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak 6M) (PL-3/5), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:00 pm
4 2 Register!  
 
         
 
Monday, December 29th, 2014
Training - Nanofabrication process discussion - LISE-G54 (JD's office)
Trainer: Jiangdong Deng
This is a free discussion with CNS staff and opens to any users who wants to get the advice and suggestion on their fabrication process in the cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
2 2 Register!  
 
         
 
 

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