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CNS Training Events - Registration Page
 

Registration is currently open for the following training sessions:

select month:
Tuesday, July 22nd, 2014
Training - B15A Sample Prep Room Safety Training - LISE B15A
Trainer: Brittany Gelfand
This training is required for access to the sample prep room. It also serves as a pre-requisite for training for other pieces of equipment located in this room. This safety training is separate and different from the LISE safety training.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 10:30 am
12 6 Register!  
 
Training - Cambridge Nanotech Atomc Layer Deposition Training - Gowning Area of CNS G-07 Cleanroom (YES, GOWNING AREA TO START)
Trainer: Mac Hathaway
Training for the Savannah ALD system
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:30 am - 11:30 am
4 3 Register!  
 
Training - HAR-050 Sputter Coater Training - LISE B15A
Trainer: Brittany Gelfand
This training is required in order to use the sputter coater. Used for creating conductive films for FESEM.
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:00 am
6 2 Register!  
 
Training - Heidelberg uPG501 Direct Write Lithography Training - Meet in the metrology bay of the cleanroom.
Trainer: Guixiong Zhong
Training on the Heidelberg uPG501 direct-write lithography system. This tool can be used to expose positive and negative photoresist without the need for a photomask; it can also be used to write photomasks. The tool has 2 micron or better feature resolution, 1 micron alignment accuracy.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  11:00 am - 12:00 pm
4 FULL Registration Closed  
 
Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exceptions are NNIN/C or Remote Users Only. This training can be taken prior to turning in enrollment paperwork.
  Time Max Attendees Available Open Event!
  9:30 am - 12:00 pm
9:30 am - 12:00 pm. For a map and driving directions to the LISE Building, please see the URL: http://www.cns.fas.harvard.edu/contact/index.php
15 3 Register!  
 
Training - Nanofabrication Cleanroom Orientation - Meet in front of G 07 Promptly
Trainer: John Tsakirgis
To understand the gowning protocols, chemical usage and toxic gas evacuation here at CNS.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
PLease be on time..
5 FULL Registration Closed  
 
Training - OL 770-LED Test and Measurement System Training -
Trainer: Jason Tresback
The OL 770-LED Test and Measurement System (MET-13) is a high-speed, CCD-based spectro-radiometer that can be used to measure 2-pin/wire electroluminescent devices to determine total radiant flux, total luminous and spectral flux, total power, dominant wavelength, spectral purity, correlated color temperature, peak wavelength, color rendering index, and chromaticity. There is currently one standard LED holder and K2400 source meter to provide constant current or voltage (input power) and measure total light output power. We meet outside LISE G27 in hallway
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 3:00 pm
3 3 Register!  
 
Training - Plate reader training - LISE G05
Trainer: Monica Zugravu
This plate reader supports top and bottom fluorescence intensity, UV-visible absorbance and high performance luminescence detection in a variety of applications, such as: cell viability, growth, toxicity, ELISA, caspase and DNA assays. Basic operation principles and data analysis and export will be shown.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 1:30 pm
3 2 Register!  
 
Training - Rapid Thermal Processing 2 - Meet in front of PVD Bay
Trainer: John Tsakirgis
To understand the operation and safety of RTP2 processing at CNS.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:00 am
Please be on time
3 2 Register!  
 
Training - RCA Clean station - meet inside cleanroom in front of wet bay
Trainer: John Tsakirgis
To understand the operation and safety pof the RCA Station at CNS
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
Please be prompt and bring cleanroom notebook
5 5 Register!  
 
Training - RIE-10 SPTS Rapier DRIE - Meet in LISE 319 first and then cleanroom at the tool
Trainer: Ling Xie
The SPTS’s Rapier system etches Si using Bosch switched processing for vertical profiles as well as non-switched processing for tapered profiles. The system is equipped with dual plasma sources with independently controlled primary and secondary decoupled plasma zones, with independent dual gas inlets; which results in high etch rate, good uniformity, and less tilting around wafer edge. The Electro-Static Clamping Chuck enables good wafer clamping, less wafer bowing compared with mechanical clamping, and wafer-less chamber cleaning. The attached AMS chiller can control the chuck temperature from -20°C to + 40°C and the Claritas end point detector can minimize the micro-trenches of SOI wafer etch as well as control the pre-etch and the post-etch cleaning.

Application

• Si etch solely
• High aspect ratio etch: 5 – 50
• Deep etch: 5µm – through Si wafer etch
• Broad features: from nano- to mm- scales in lateral dimension
• Side wall roughness (scallop depth): 6nm – 700nm
• Only resists and SiO2 or Si3N4 allowed as etching mask
• Handle samples ≤ 6”
• Absolutely no-metal mask or metal stop layer
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 4:00 pm
4 1 Register!  
 
Training - Sharon EE-3 e-beam evaporator training - We meet in the cleanroom PVD bay (LISE G07)
Trainer: Ed Macomber
E-beam evaporation in EE-3 is covered; EE-3 can deposit 19 different materials (metals). We will cover venting, loading the sample, pumping down (vacuum system) and the actual deposition. Plan on ~2 hr for this training. We meet in the cleanroom PVD bay (LISE G07).
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 3:00 pm
(Please review document links in email confirmation)
4 2 Register!  
 
Training - Soft Materials Cleanroom training - Meet in front of G07
Trainer: Monica Zugravu
This training will provide the safety requirements and equipment overview inside the Soft Materials Cleanroom and is required for accessing this facility.
  Time Max Attendees Available CNS Users ONLY
  9:30 am - 10:30 am
4 FULL Registration Closed  
 
Training - Thermo Scientific K-Alpha XPS Training - G27
Trainer: Hao-Yu (Greg) Lin
Training on the new Thermo XPS system.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 1:00 pm
4 2 Register!  
 
Training - UV-VIS spectrometer - LISE G04
Trainer: Arthur McClelland
Learn to use the UV-VIS spectrometer in transmission or reflection mode
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:00 am
3 2 Register!  
 
Training - Witec confocal Raman Microscope training - LISE-G12
Trainer: Jiangdong Deng
In this training, we will go through the basic operation procedure of WiTec Raman system. After this training, you will learn how to check the system, to get the single Raman spectrum, to build Raman image. This course is required for advanced WiTec NSOM/AFM/Raman training
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 3 Register!  
 
         
 
Wednesday, July 23rd, 2014
Training - Advanced SPM (scanning Probe Micrscope) techniques - LISE-G12
Trainer: Jiangdong Deng
In this advanced SPM training session, some special techniques of SPM (mainly on Asylum-AFM system) will be introduced, including MFM, ORCA, nano-indentation, SPM-lithography and others. Before taking this training, user should pass the basic AFM training session, and have the access of Asylum-AFM.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:30 pm
2 1 Register!  
 
Training - FTIR Spectroscopy Training - LISE G04
Trainer: Arthur McClelland
Learn to use the Perkin Elmer FTIR in transmission, variable angel specular reflection, or ATR mode.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:00 am
3 1 Register!  
 
Training - RIE-8 STS RIE Training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
The STS MPX/LPX RIE system is an Inductively Coupled Plasma Reactor that is used for Reactive Ion Etch. Using the ICP technology, this etch system is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity and low energy ion damage. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 15 to 30°C.

Attention: Only Si-based materials, including Si, a-Si, SiO2, and Si3N4, are allowed to be etched in this system. All other materials are forbidden.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:00 pm
4 3 Register!  
 
Training - SU-8 photolithography process training - Meet in the Cleanroom at the photolithography bay (G07)
Trainer: Hao-Yu (Greg) Lin
Training on MJB4 contact aligner with focus on SU-8 photo resist process.
Please complete Wetbench + Chemical Safety Training before SU-8 process training.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 1 Register!  
 
Training - Training on the Heidelberg DWL66 Mask writer Part-1 - Ebeam bay
Trainer: Amehayesus Gebreyohannes
this is a the first part of a two-part training, a group session covering the operation of the tool. The second, certification training will be conducted one-on-one, and scheduled after the completion of part 1. Users will bring their own mask job(s) to write in part 2. Users will be required to use the DWL66 at least once every 6 months to stay certified, if the tool is not used for greater than six months another part 2 certification session will need to be conducted.

Please see the tool webpage for more information on the capabilities of this tool.

Use of the DWL66 is for producing masks only; for direct-write lithography of other objects, please look into training on the Heidelberg uPG501

Prerequisite: Wetbench + Chemical Safety Training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
3 1 Register!  
 
Training - Wetbench + Chemical Safety Training - We meet OUTSIDE G-07 Gowning Area (YES, OUTSIDE, then we go UPSTAIRS)
Trainer: Mac Hathaway
Training for use of the CNS wetbenches, with special emphasis on chemical safety, with some process engineering and other select topics
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:30 pm
8 3 Register!  
 
         
 
Thursday, July 24th, 2014
Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic operation and imaging demonstrated by staff followed by part-2, individual user assisted session that serves as a user qualification on another day. Please register for each event and meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 FULL Registration Closed  
 
Training - Denton e-beam evaporator (EE-4) - LISE G07 (cleanroom); PVD Bay
Trainer: Ed Macomber
Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Ge, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 2:30 pm
(check links in confirmation email for documents)
5 1 Register!  
 
Training - FTIR microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Bruker Lumos in Transmission, ATR, and Reflection modes.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 3 Register!  
 
Training - G06 CHEMICAL NANOTECHNOLOGY ROOM TRAINING - LISE G06
Trainer: Monica Zugravu
Safety features of the Chemical Nanotechnology room including the two ReynoldsTech wet benches will be presented.
Please be on time. I will wait for you 10 min. max. and then I will start the training inside G06. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 2:00 pm
6 FULL Registration Closed  
 
Training - Nanofabrication Cleanroom Orientation - Please meet in front of G 07 promptly
Trainer: John Tsakirgis
To be comfortable with gowning protocol, chemical safety and toxic gas evacuation.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
please be prompty
5 FULL Registration Closed  
 
Seminar - Nanoparticle Characterization Workshop - LISE 303
Trainer: Fettah Kosar
A comparison of 2 complementary technologies –
DLS and NanoSight Tracking Analysis

This seminar will explain the strengths and weaknesses of dynamic light scattering (DLS) and NanoSight Tracking Analysis (NTA) technologies. DLS based instruments have been available for decades and can be found in most medical/biomedical, industrial, and academic institutions. Recent advances in technology have allowed for the calculation of protein charge, the protein interaction parameter Kd, and the development of the novel diffusion barrier technique.
NTA based instruments have been available for the past 12 years and have made significant research contributions in the fields of protein aggregation, virology and vaccine development, nanoparticle toxicity and environmental impact, drug delivery and targeting, exosome and microvesicle research, and nanoparticle production to name a few.
Both DLS and NTA instruments will be demonstrated live.

Speakers:
Dr. Ragy Ragheb
Application Specialist
Mr. Kevin R. Riley
Senior Account Manager

The event will be held at:
11 Oxford St., LISE 303, Cambridge, MA 02138

LUNCH WILL BE PROVIDED TO REGISTERED ATTENDEES ONLY!
  Time Max Attendees Available Open Event!
  10:00 am - 2:00 pm
Event is free and open to public.
40 5 Register!  
 
Training - Soft Lithography Training - G06
Trainer: Hao-Yu (Greg) Lin
Training includes PDMS process, KLA-Tencor profiler, UV flood exposure system, plasma prep II and wax printer
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 1:00 pm
2 FULL Registration Closed  
 
Training - SP-3 AJA sputtering system training – 3-gun system - CNS cleanroom (G-07) Dry Bay
Trainer: Ed Macomber
This training is for standard operating procedure of SP-3 sputtering system. The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with one RF and one DC gun. After an additional one-to-one training for target changes, the user can then change targets to fit their own schedule. After 4 uses (with no problems) users are given 24/7 access.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30 pm - 3:30 pm
(check document links in confirmation email)
4 1 Register!  
 
Training - X-ray MicroCT Training - LISE G27
Trainer: Fettah Kosar
Covers the basic training on the X-Tek HMXST225 X-ray imaging and computed tomography system, as well as a brief introduction to VGStudio Max 2.2 3D visualization and rendering software. For more information about our MicroCT system, please visit the instrument's webpage at:
http://www.cns.fas.harvard.edu/facilities/tool_detail.php?MID=151
PREREQUISITES - Prior to the training:
1) Complete the "CNS X-Ray Safety Requirements Form" and submit it to CNS Admin Office in LISE 306.
http://www.cns.fas.harvard.edu/users/Forms/FM004_r1_6_Pre-Training_Requirements_MicroCT.pdf
2) Study the "X-ray MicroCT Training Presentation".
http://www.cns.fas.harvard.edu/facilities/docs/X-ray%20MicroCT%20Training%20Presentation%20-%202013-03-19.pdf
3) Bring a paper copy of "SOP086 MicroCT Quick Guide".
http://www.cns.fas.harvard.edu/facilities/docs/SOP086_r7_4_X-Tek%20MicroCT%20Quick%20Guide.pdf
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:30 pm
Meet at the door of LISE G27
2 FULL Registration Closed  
 
         
 
Friday, July 25th, 2014
Training - AS200 i-line stepper training-Part II -
Trainer: Guixiong Zhong
This is the second part of a two part stepper training. Manual loading, unloading, aligning, and basic overlay strategy will be covered. The prerequisite is AS200 i-line stepper training-Part I.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:30 am - 12:30 pm
4 4 Register!  
 
Training - Atomic Force Microscopy Part-2 Individual User Qualification (Asylum MFP3D -AFM) - LISE G12
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:00 pm
3 FULL Registration Closed  
 
Training - Disco ADA-321 Automatic Dicing Saw Training Part 2-User Qualification - LISE G06
Trainer: Jason Tresback
This training event will allow individual users to operate the dicing saw with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own samples, otherwise a one will be provided for training purposes. Full tool access requires attending part 1-basic operation and demonstration by staff, followed by individual User qualification on another day, AND completion of the LISE G06 Room Safety Training events. Please register for each event.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:00 pm
3 1 Register!  
 
Training - JA Woollam Spectroscopic Ellipsometer - LISE-G07, metrology bay
Trainer: Jiangdong Deng
This trainng will cover the basic principle, operation procedure and data analysis (basic) of JAW spectro-ellipsometer.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 3 Register!  
 
         
 
Monday, July 28th, 2014
Training - 3D printing with the Makerbot - LISE G06
Trainer: Arthur McClelland
Learn to use the 3D printer to make objects out of ABS or PLA plastics from a .STL file
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 11:30 am
3 2 Register!  
 
Training - Electrical Characterization Part 1- Van der Pauw Resistivity and Hall Measurement System (MET-5) - LISE G27
Trainer: Jason Tresback
This training event will cover a basic introduction to electrical property measurements of semiconducting materials at CNS. Sample sizes up to 20x20 mm, containing highly ohmic contact electrodes that form a square with 5-20 mm center to center spacing are recommended for using this Hall measurement system. Room temperature operation of the Van der Pauw resistivity and Hall measurement system (MET-5) will be demonstrated and contact electrode recommendations will be discussed. Temperature dependent measurements in the range of 100K to 700K can only be made by staff assisted use. Email (jtresback@cns.fas.harvard.edu) if you have any questions, and we meet in the hallway outside LISE G27.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 3:00 pm
3 3 Register!  
 
Training - Low Temperature (LT) 4-Point Probe Station Training - LISE G27
Trainer: Jason Tresback
This training event will begin by demonstrating basic operations of the Low Temperature (LT) 4-pt Probe Station for electrical characterization measurements as a function of temperature from 80K to 450K using liquid N2. The system is currently configured with four BeCu or Tungsten blade probes (10 and 25um radius). Liquid helium can be supplied by users for measurements ranging from 1.5K to 450K. Full tool access will require at least one user assisted session to be scheduled on another day. Please email jtresback@cns.fas.harvard.edu if you have any questions. We meet in the hallway outside LISE G27
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:30 am
3 2 Register!  
 
Training - Nanofabrication process discussion - LISE-G54 (JD's office)
Trainer: Jiangdong Deng
This is a free discussion with CNS staff and opens to any users who wants to get the advice and suggestion on their fabrication process in the cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
2 1 Register!  
 
Training - O2 Plasma Stripper system (RIE-5 and RIE-9) - LISE-G07, in the main cleanroom, metrology bay
Trainer: Jiangdong Deng
This training would cover the basic operation procedure of two O2 plasma strippers in the cleanroom .
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 4:30 pm
4 3 Register!  
 
Training - Zeiss EVO 50 SEM basic operation -
Trainer: Brittany Gelfand
This session will cover the SmartSEM user interface, and practical aspects of generating images on the EVO under high vacuum conditions. The 3 main image generating detectors will be covered, and the importance of the different user-switchable pole-piece apertures used under different vacuum conditions.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 4:00 pm
3 FULL Registration Closed  
 
         
 
Tuesday, July 29th, 2014
Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic operation and imaging demonstrated by staff followed by part-2, individual user assisted session that serves as a user qualification on another day. Please register for each event and meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 2 Register!  
 
Training - Basic Confocal Microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Olympus FV300 Confocal microscope
  Time Max Attendees Available CNS Users ONLY
  10:30 am - 12:00 pm
3 3 Register!  
 
Training - Cambridge Nanotech Atomic Layer Deposition Training - Gowning area - G-07 Cleanroom (Meet in GOWNING AREA)
Trainer: Mac Hathaway
Training on the ALD oxide system

For Metals and Nitrides, you will need to use the Gemstar - ALD-2
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:30 am - 11:00 am
4 FULL Registration Closed  
 
Training - CVD - 2 Nexx PECVD System - Dry Processing Bay - LISE Cleanroom
Trainer: Philippe de Rouffignac
NEXX CVD-2 is an ECR (electron cyclotron resonance) plasma-enhanced CVD system. ECR technology produces high plasma density and low ion energy at low chamber pressure, allowing the deposition of high-quality films at relatively low temperature. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled in < 120 ºC range. The entire system is fully computer controlled. Available gases are He, Ar, N2, O2, 3% SiH4 and Ar. Films that can be deposited include SiO2, SiN4 and a-Si thin films.
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 4:00 pm
Established SiO2, Si3N4, low-stress Si3N4, and amorphous Si film deposition conditions and results are listed in the Nexx PECVD Logbook.
3 3 Register!  
 
Training - CVD-3 STS PECVD - cleanroom, dry-processing bay
Trainer: Philippe de Rouffignac
The STS PECVD system utilizes two RF power supplies (LF and HF) to produce a medium density plasma that produces silicon based films depending on the process gases. The system has optimized recipes for SiO2 (at 190 and 300C), Si3N4 (at 190 and 300C), SiON, and a:Si (doped P, B and undoped).
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
4 3 Register!  
 
Training - Edwards EE-2 e-beam evaporator training - LISE G07 (CNS cleanroom) – PVD Bay
Trainer: Ed Macomber
Edwards EE-2 e-beam evaporator is capable of depositing many oxides and nitrides such as SiO2, Al2O3, TiO2, MgF2, Si3N4, etc., as well as some common metals, if needed. The operating pressure of the system is E-5 to E-6 torr. Users supply their own crucibles and materials for EE-2. The system deposits directionally so that the sidewalls of features are not coated. This makes the system a preferable choice for processing devices that will undergo a lift-off later in the fabrication chain. The training entails going through an entire operating procedure using a mock test sample.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  12:00 pm - 2:00 pm
(Check confirmation email for document links)
4 2 Register!  
 
Training - Introduction To Photolithography (Headway Spinner and Contact Aligner Training) - Photo bay inside the clean room
Trainer: Amehayesus Gebreyohannes
this training covers all the basic steps for a photolithography process,
we'll look at spinner bench processes and procedures, cleaning wafers (samples), coating, backing exposing and developing samples. exposure will be done on the karl suss MJB4 mask aligner and basic operation of the MJB3 mask aligner will be covered


Prerequisite: Wetbench + Chemical Safety Training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 FULL Registration Closed  
 
Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exceptions are NNIN/C or Remote Users Only. This training can be taken prior to turning in enrollment paperwork.
  Time Max Attendees Available Open Event!
  9:30 am - 12:00 pm
9:30 am - 12:00 pm. For a map and driving directions to the LISE Building, please see the URL: http://www.cns.fas.harvard.edu/contact/index.php
15 8 Register!  
 
Training - LPCVD and APCVD Training - Dry-Processing Bay
Trainer: Philippe de Rouffignac
Training for all 6 furnaces of the Tystar System
(SiNx, Poly, TEOS, Oxidation, non-metal anneal, metal anneal) CVD 5,6,7,9,10,11
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:30 am
4 2 Register!  
 
Training - Nanofabrication Cleanroom Orientation - Meet in front of G 07 Promptly
Trainer: John Tsakirgis
To understand the gowning protocols, chemical usage and toxic gas evacuation here at CNS.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
PLease be on time..
5 FULL Registration Closed  
 
Training - OL 770-LED Test and Measurement System Training -
Trainer: Jason Tresback
The OL 770-LED Test and Measurement System (MET-13) is a high-speed, CCD-based spectro-radiometer that can be used to measure 2-pin/wire electroluminescent devices to determine total radiant flux, total luminous and spectral flux, total power, dominant wavelength, spectral purity, correlated color temperature, peak wavelength, color rendering index, and chromaticity. There is currently one standard LED holder and K2400 source meter to provide constant current or voltage (input power) and measure total light output power. We meet outside LISE G27 in hallway
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 3:00 pm
3 3 Register!  
 
Training - Rapid Thermal Processing 2 - Meet in front of PVD Bay
Trainer: John Tsakirgis
To understand the operation and safety of RTP2 processing at CNS.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:00 am
Please be on time
3 2 Register!  
 
Training - RCA Clean station - meet inside cleanroom in front of wet bay
Trainer: John Tsakirgis
To understand the operation and safety pof the RCA Station at CNS
  Time Max Attendees Available LISE Cleanroom Users ONLY
  9:00 am - 10:00 am
Please be prompt and bring cleanroom notebook
5 5 Register!  
 
Training - Soft Materials Cleanroom training - Meet in front of G07
Trainer: Monica Zugravu
This training will provide the safety requirements and equipment overview inside the Soft Materials Cleanroom and is required for accessing this facility.
  Time Max Attendees Available CNS Users ONLY
  9:30 am - 10:30 am
4 3 Register!  
 
Training - Witec confocal Raman Microscope training - LISE-G12
Trainer: Jiangdong Deng
In this training, we will go through the basic operation procedure of WiTec Raman system. After this training, you will learn how to check the system, to get the single Raman spectrum, to build Raman image. This course is required for advanced WiTec NSOM/AFM/Raman training
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 4 Register!  
 
         
 
Wednesday, July 30th, 2014
Training - Advanced SPM (scanning Probe Micrscope) techniques - LISE-G12
Trainer: Jiangdong Deng
In this advanced SPM training session, some special techniques of SPM (mainly on Asylum-AFM system) will be introduced, including MFM, ORCA, nano-indentation, SPM-lithography and others. Before taking this training, user should pass the basic AFM training session, and have the access of Asylum-AFM.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 3:30 pm
2 1 Register!  
 
Training - FTIR Spectroscopy Training - LISE G04
Trainer: Arthur McClelland
Learn to use the Perkin Elmer FTIR in transmission, variable angel specular reflection, or ATR mode.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:00 am
3 3 Register!  
 
Training - Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Cleanroom
Trainer: Jason Tresback
This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak 6M) (PL-3/5), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:30 pm
4 2 Register!  
 
Training - Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE G07 Cleanroom
Trainer: Jason Tresback
This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Metrology for Nanofabrication-1 is NOT required to attend this part-2 training. Full independent access to the AFM (SPM-5) requires completion of part-1 basic imaging and operation demonstrated by staff followed by at least one individual user assisted session that serves as a user qualification on another day. AFM probes are provided for training; however users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
4 2 Register!  
 
Training - RIE-1 SouthBay Training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
A parallel plate low density plasma reactor with available gases of SF6, CF4, CHF3, O2, and Ar. This RIE is able to etch Si, SiO2, Si3N4, W, Ti, etc.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  3:00 pm - 4:00 pm
4 4 Register!  
 
Training - Training on the Heidelberg DWL66 Mask writer Part-1 - Ebeam bay
Trainer: Amehayesus Gebreyohannes
this is a the first part of a two-part training, a group session covering the operation of the tool. The second, certification training will be conducted one-on-one, and scheduled after the completion of part 1. Users will bring their own mask job(s) to write in part 2. Users will be required to use the DWL66 at least once every 6 months to stay certified, if the tool is not used for greater than six months another part 2 certification session will need to be conducted.

Please see the tool webpage for more information on the capabilities of this tool.

Use of the DWL66 is for producing masks only; for direct-write lithography of other objects, please look into training on the Heidelberg uPG501

Prerequisite: Wetbench + Chemical Safety Training
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:00 pm - 4:00 pm
3 3 Register!  
 
Training - Wetbench + Chemical Safety Training - We meet OUTSIDE G-07 Gowning Area (YES, OUTSIDE, then we go UPSTAIRS)
Trainer: Mac Hathaway
Training for use of the CNS wetbenches, with special emphasis on chemical safety, with some process engineering and other select topics
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 12:30 pm
8 8 Register!  
 
Training - XeF2 Etcher training - LISE Cleanroom G07 at the tool
Trainer: Ling Xie
Isotropic etching of Si.
  Time Max Attendees Available CNS Users ONLY
  4:00 pm - 4:30 pm
4 4 Register!  
 
         
 
Thursday, July 31st, 2014
Training - Atomic Force Microscopy Part-2 Individual User Qualification (Asylum MFP3D -AFM) - LISE G12
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:00 pm
3 FULL Registration Closed  
 
Training - DelsaNano C Training - Particle Size - LISE G06
Trainer: Fettah Kosar
Beckman Coulter DelsaNano C is a user-friendly dynamic light scattering instrument, which can analyze size as well as zeta potential of nanoparticles (about 1nm - 6um). This training covers the size measurement portion. Zeta potential training can be arranged as a one-on-one assisted session after taking this first training. For more information about our DelsaNano C, please visit the instrument's webpage at:
http://www.cns.fas.harvard.edu/facilities/tool.php?MID=181
PREREQUISITES: "LISE G06 Room Training" and "CNS Nanoparticle Safety Requirements Form" must be completed prior to attending this training.
http://www.cns.fas.harvard.edu/users/Forms/FM008_r1_3_Pre-Training_Requirements_for_Working_with_Nanoparticles.pdf
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:30 pm
Meet at the entrance of LISE G06.
2 2 Register!  
 
Training - Finetech Flip Chip Bonder - G12
Trainer: Guixiong Zhong
Basic training for the Finetech Flip chip bonder. Fineplacer Lambda Manual Sub-Micron Flip-Chip Bonder provides accurate alignment and placement of a device chip to a substrate as an advanced form of chip interconnection. During the bonding process, both chip and substrate are typically heated to an alloying temperature of the interconnect material.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 3:30 pm
4 4 Register!  
 
Training - FTIR microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Bruker Lumos in Transmission, ATR, and Reflection modes.
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 2 Register!  
 
Training - LSD-100 Scriber/Cleaver for III-V materials - G12
Trainer: Guixiong Zhong
Basic training to use the scriber/cleaver.
  Time Max Attendees Available CNS Users ONLY
  4:30 pm - 5:00 pm
4 3 Register!  
 
Training - Nanofabrication Cleanroom Orientation - Please meet in front of G 07 promptly
Trainer: John Tsakirgis
To be comfortable with gowning protocol, chemical safety and toxic gas evacuation.
  Time Max Attendees Available Open Event!
  1:00 pm - 2:30 pm
please be prompty
5 3 Register!  
 
Training - RIE-6 Nexx ECR RIE Training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
NEXX RIE-6 is an ECR (electron cyclotron resonance) RIE system. ECR technology produces high plasma density and low ion energy at low chamber pressure and results in low plasma damage and high etch rate. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled < 120 ºC. The entire system is fully computer controlled. Available gases on this tool include He, Ar, O2, CF4, CHF3, Cl2, CH4, and H2. Except polymer stripping, all other materials’ dry etchings are allowed.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:30 pm - 3:00 pm
4 3 Register!  
 
Training - Sharon TE-3, 4, and 5 thermal evaporator training - LISE G07 (CNS Cleanroom), PVD Bay
Trainer: Ed Macomber
Training on TE-3, 4 and 5 for thermal evaporation of metals is covered. We meet at the system in the CNS cleanroom PVD bay. Training takes about 2 hours. Venting, loading a sample, pumping and evaporation are performed and explained. For these TE systems, users supply their own deposition materials and boats (sources). CNS supplies the materials for training. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, etc.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  2:30 pm - 4:30 pm
(Please review document links in email confirmation)
4 3 Register!  
 
Training - Wire bonder training - G12
Trainer: Guixiong Zhong
Basic training to use the wire bonder. This wedge bonder is configured for bonding aluminum wire (.001") to gold.
  Time Max Attendees Available CNS Users ONLY
  3:30 pm - 4:30 pm
4 4 Register!  
 
         
 
 

CNS USER PROGRAM FAQ

CNS USER PROGRAM MANUAL

07/24/14
CNS Special Event: Nanoparticle Characterization: A Comparison of 2 Complementary Technologies - DLS and NanoSight Tracking Analysis

Free 2014 CNS Summer Courses. Nanocharacterization and Soft Matter

2014 CNS Nanofabrication Summer School

Free Trainings Announced for new Plate Reader in G05 Biomaterials Lab

08/18/14 to 08/21/14
IEEE Nano 2014 - Toronto

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