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CNS User Info
» Overview
» How do I become a CNS/NNIN user?
» Acknowledgement
» Nanofabrication Facility Use
» Imaging Facility Use
» NanoMaterials Facility Use
» Forms
» CNS User Fees
» General User Information and Policy
» Training Sign-up
   
   
   
   
CNS Training Events - Registration Page
 

Registration is currently open for the following training sessions:

select month:
Date TBD - you can pre-register for this training session
CNS staff will notify you when a date has been set.
Training - Focused Ion Beam (FIB/SEM) Training Waitlist -
Trainer: Andrew Magyar
A wait list for training on the new FEI FIB/SEM. This list is for users who are not currently trained on the Zeiss NVision 40.
  Time Max Attendees Available CNS Users ONLY
  99 99 Pre-Register!  
 
         
 
Thursday, October 30th, 2014
Training - AJA SP-2 training - 6 gun sputter system - LISE Bldg, room 303 - LISE G07 cleanroom
Trainer: Ed Macomber
The SP-2 system is a 6-gun magnetron sputtering machine with (3) RF guns and (3) DC guns to cover a range of metals, semi-conductors, and dielectric materials, including Au, Pt, and magnetics. Sputtering materials are loaded into the system weekly on an "as-requested" basis. Substrate pre-cleaning, heating, co-sputtering, and reactive sputtering are all available on this system.

1:00pm - ~2pm: We meet in LISE, room 303 (on the third floor just off of the "Gray Room" common space). Theory and explanation of system operation; followed by a question and answer period.

2:15pm - ~3:45pm: We continue in the CNS cleanroom, LISE G07, at the SP-2 system in the Dry Process bay. Hands-on loading of the sample, deposition control with the laptop computer, and unloading of the sample are covered.

  Time Max Attendees Available LISE Cleanroom Users ONLY
  1:00 pm - 4:00 pm
Please check links in confirmation email for documentation
5 FULL Registration Closed  
 
Training - ALD-2 Arradiance GEMStar ALD and Pulsed CVD Training - LISE CNS Cleanroom (G07) Wet Processing Bay
Trainer: Philippe de Rouffignac
The GEMStar ALD and Pulsed CVD system from Arradiance Inc. a mid-temperature (160 - 375 C) deposition system that uses surface self limiting reactions in ALD mode and traditional CVD reactions to grow conducting metal nitride and pure metal films with good uniformity, conformality, and material purity.
  Time Max Attendees Available LISE Cleanroom Users ONLY
  10:00 am - 11:00 am
5 5 Register!  
 
Training - Atomic Force Microscopy Part-2 Individual User Qualification (Asylum MFP3D -AFM) - LISE G12
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE G12
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 5:00 pm
3 3 Register!  
 
Training - CNS Cleanroom Orientation - Please meet in front of G07
Trainer: John Tsakirgis
To understand our protocols and safety concerns at CNS
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:30 am
please br prompt and remember to bring your Forms
5 2 Register!  
 
Training - CVD-13 PECVD Diamond Seki System - G27
Trainer: Philippe de Rouffignac
Microwave plasma system designed to grow diamond films from an existing diamond surface (nanoparticle or film). This tool can also be used for hydrogen plasma treatment and for carbon nanotube growth (contact tool owner if interested in CNTs; not automatically available to every user)
  Time Max Attendees Available CNS Users ONLY
  2:30 pm - 4:00 pm
3 2 Register!  
 
Training - FTIR Spectroscopy Training - LISE G04
Trainer: Arthur McClelland
Learn to use the Perkin Elmer FTIR for analysis of solids, liquids, or powders
  Time Max Attendees Available CNS Users ONLY
  1:30 pm - 2:30 pm
3 2 Register!  
 
Training - G06 CHEMICAL NANOTECHNOLOGY ROOM TRAINING - LISE G06
Trainer: Monica Zugravu
Safety features of the Chemical Nanotechnology room including the two ReynoldsTech wet benches will be presented.
Please be on time. I will wait for you 10 min. max. and then I will start the training inside G06. Unfortunately, if you are late, I may not hear you knock on the door while I give the training.
  Time Max Attendees Available CNS Users ONLY
  1:00 pm - 2:00 pm
6 2 Register!  
 
Training - Soft Lithography Training - G06
Trainer: Hao-Yu (Greg) Lin
Training includes PDMS process, KLA-Tencor profiler, UV flood exposure system, plasma prep II and wax printer
  Time Max Attendees Available CNS Users ONLY
  11:00 am - 2:00 pm
2 FULL Registration Closed  
 
Training - UV-VIS spectrometer - LISE G04
Trainer: Arthur McClelland
Learn to use the Cary 60 UV/VIS spectrometer in transmission and reflection mode.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 11:00 am
3 2 Register!  
 
         
 
Friday, October 31st, 2014
Training - AS200 i-line stepper training-Part II - Meet in the photolithography bay of the cleanroom.
Trainer: Guixiong Zhong
This is the second part of a two part stepper training. Manual loading, unloading, aligning, and basic overlay strategy will be covered. The prerequisite is AS200 i-line stepper training-Part I.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:00 pm
4 3 Register!  
 
Training - JA Woollam Spectroscopic Ellipsometer - LISE-G07, metrology bay
Trainer: Jiangdong Deng
This trainng will cover the basic principle, operation procedure and data analysis (basic) of JAW spectro-ellipsometer.
  Time Max Attendees Available CNS Users ONLY
  10:00 am - 12:00 pm
4 3 Register!  
 
Training - SEM training part 1 - LISE 303
Trainer: Dave Lange
Introduction to using the SEM including basic background and detectors available on the SEMs at CNS.
  Time Max Attendees Available CNS Users ONLY
  2:00 pm - 4:30 pm
15 1 Register!  
 
         
 
 

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