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Nanofabrication Facility
 South Bay RIE
CNS ID: RIE-1
Make: South Bay Tech.
Model: RIE-2000
Category: Dry Process
Name: South Bay RIE
Location: LISE - Cleanroom G07
 
 
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More Info: 
The SouthBay reactive ion etcher is for anisotropic etching. It is a capacitive coupled parallel plate plasma reactor and equipped with 200W RF generator, manual matching network, 6� sample stage, and turbo pump. Available etching gases with this tool include SF6, CF4, CHF3, O2, and Ar.
Comments: 
RIE-1 can be used to etch Si, SiO2, Si3N4, W, Ti, and other substrate materials.
 
Contact Info:
Ling Xie
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-496-9069
lxiecns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
 
 

05/06/13
New Computational Cluster On-Line
 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.
 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.
 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo
 

DRIE system on site - available soon.
 

01/18/13
i-line stepper coming to CNS this spring!
 

08/14/12
We bought the k-alpha XPS - it will be staying!
 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!
 

10/04/12
XeF2 etch system now available!
 

02/21/12
Time Resolved PL Spectroscopy now available
 
 
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