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Nanofabrication Facility
 South Bay RIE
CNS ID: RIE-1
MakeSouth Bay Tech.
ModelRIE-2000
CategoryDry Process
NameSouth Bay RIE
LocationLISE - Cleanroom G07
 
 
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More Info
The SouthBay reactive ion etcher is for anisotropic etching. It is a capacitive coupled parallel plate plasma reactor and equipped with 200W RF generator, manual matching network, 6� sample stage, and turbo pump. Available etching gases with this tool include SF6, CF4, CHF3, O2, and Ar.
Comments
RIE-1 can be used to etch Si, SiO2, Si3N4, W, Ti, and other substrate materials.
 
Contact Info:
Ling Xie
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-496-9069
lxiecns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
 
 

10/06/14
New RIE-11 Plasma-Therm VersaLine Diamond RIE Going Online! Trainings to be announced soon!