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Nanofabrication Facility
 Sharon E-Beam Evaporator
CNS ID: EE-3
Make: Sharon
Model: N/A
Category: Physical Vapor Deposition
Name: Sharon E-Beam Evaporator
Location: LISE - Cleanroom G07
 
 
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More Info: 
Equipment description and usage: SHARON EE-3 is an e-beam evaporation system suitable for depositing metal thin films. The system has a six-pocket e-gun with a 10 kW power supply. Film thickness is in-situ monitored by quartz crystal monitor. The systems vacuum is supported by a cryopump and an oil-free roughing pump. Vacuum can reach 10e-8 torr range.

Applications: This system is currently set up for depositing low vapor-pressure metal materials. These metals include: Ag, Au, Co, Cr, Cu, Ge, Mo, Ni, NiFe (permalloy), Pd, Pt,and Ti. Others may be added at the request of system users.
Comments: 
 
Contact Info:
Ed Macomber
LISE G44
11 Oxford Street
Cambridge, MA 02138
617-384-5227
eddiemaccns.fas.harvard.edu
Jason Tresback
LISE G46
11 Oxford Street
Cambridge, MA 02138
617-496-1783
jtresbackcns.fas.harvard.edu
 
 

05/06/13
New Computational Cluster On-Line
 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.
 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.
 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo
 

DRIE system on site - available soon.
 

01/18/13
i-line stepper coming to CNS this spring!
 

08/14/12
We bought the k-alpha XPS - it will be staying!
 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!
 

10/04/12
XeF2 etch system now available!
 

02/21/12
Time Resolved PL Spectroscopy now available
 
 
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