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More Info:
EE-2 is an e-beam evaporator recommended for oxide and nitride materials. Designed to operate around the e-5 millibar vacuum range, EE-2 can also be used to deposit metals (non-toxic materials) if very low pressure is not a critical factor in your process. The water-cooled substrate holder can accommodate one wafer up to 3” diameter. EE-2 has a rotary-vane mechanical roughing pump and a turbo high-vacuum pump, and is a relatively low voltage (~3.8kV) electron beam evaporation deposition system with a 4-pocket, water-cooled rotating hearth.
Comments:
The materials used in EE-2 are user-supplied.
Contact Ed Macomber if you have questions or if you would like training on this system
Contact Info:
Ed Macomber
LISE G44
11 Oxford Street
Cambridge, MA 02138
617-384-5227
eddiemaccns.fas.harvard.edu
Ling Xie
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-496-9069
lxiecns.fas.harvard.edu
cns.fas.harvard.edu
