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More Info:
Equipment description and usage:
Lesker EE-1 is a 4-pocket electron beam evaporation system used for depositing ultra-pure films of materials that are difficult to deposit by thermal evaporation, such as dielectrics and high-melting-point metals, with high throughput, sequential coating capability and excellent deposition flexibility. The system is also fitted with a quartz crystal monitor for film thickness control. The system’s base pressure reaches 10-6 to 10-7 torr range by cryo pumping.
Applications:
This is system is currently configured for general material deposition.
Features:
* Four target pockets
* One e-beam source for sequential thin film deposition
* Quartz crystal monitor for closed loop thickness control
* Cryo pump, base pressure in the 10-6 to 10-7 torr range
Comments:
Any non-toxic materials
Contact Info:
Ed Macomber
LISE G44
11 Oxford Street
Cambridge, MA 02138
617-384-5227
eddiemaccns.fas.harvard.edu
Ling Xie
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-496-9069
lxiecns.fas.harvard.edu
cns.fas.harvard.edu
