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Nanofabrication Facility
 Sharon Thermal Evaporator TE-4
CNS ID: TE-4
MakeSharon
ModelN/A
CategoryPhysical Vapor Deposition
NameSharon Thermal Evaporator TE-4
LocationLISE - Cleanroom G07
 
 
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More Info
Equipment description and usage:
SHARON TE-4 is a four-source thermal evaporation system for depositing thin films by resistive heating. The system has two 2.5-kW power supplies, each controls two deposition sources, allowing deposition of two materials at the same time. Film thicknesses for each pair of sources are monitored in-situ, respectively, by two quartz crystal monitors. A cryopump and oil-free roughing pump vacuum system allows base pressures down to ~2e-7 torr. If you wish to become a qualified user for this facility, you must contact Ed Macomber (eddiemac@cns.fas.harvard.edu) or JD Deng (jdeng@cns.fas.harvard.edu) for training and qualification.

Applications: This is system is currently set up for common use of depositing low vapor-pressure materials, magnetic or non-magnetic.

Features:
* Four thermal source pockets
* Two 2.5 kW power supplies, capable of sequential thin film deposition
* Quartz crystal monitor for closed loop thickness control
* Multiple substrate holders with substrate size up to 3" maximum
* Provision of water or liquid nitrogen cooling and substrate heating up to 340 °C
* Cryopump, base pressure down to ~ 2E-7 torr
Comments
Any low-vapor material
 
Contact Info:
Ed Macomber
LISE G44
11 Oxford Street
Cambridge, MA 02138
617-384-5227
eddiemaccns.fas.harvard.edu
Jason Tresback
LISE G46
11 Oxford Street
Cambridge, MA 02138
617-496-1783
jtresbackcns.fas.harvard.edu
 
 

10/06/14
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