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Nanofabrication Facility
 AS200 i-line Stepper
CNS ID: OL-7
MakeGCA
ModelAutoStep 200
CategoryLithography
NameAS200 i-line Stepper
LocationLISE - Cleanroom G07
 
 
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More Info
The system can exposure 5mm*5mm sample with no alignment. Sample thickness has to be compatible with the sample chucks. (e.g. 650um+/-100um for 6” chuck, 525um+/-100um for 4” and 380+\- 100um for 3" to 5mm)
Comments
The AS200 i-line stepper is a 5X reduction exposure tool. It is specified for 0.65 micron resolution. The system is able to handle sample sizes from 10mm to 150mm diameter, to expose transparent substrates, and to work with a variety of alignment mark materials. The overlay is specified for <0.15µm using local alignment. Global alignment is <0.25µm. Other features include: · Quick, user-capable changes between substrate sizes. · Ability to use 5” reticles which can be written by the CNS Heidelberg DWL66 maskwriter. · Automatic reticle loading and aligning. · Automatic self-calibrations · Automatic cassette-to-cassette wafer loading and aligning (for 150mm SEMI wafers) · 21mm diameter exposure field. (14.849mm*14.849mm if in square) · Store up to 10 reticles in the system · 0.45 numeric aperture
 
Contact Info:
Guixiong Zhong
LISE G42
11 Oxford Street
Cambridge, MA 02138
617-384-5672
gzhongcns.fas.harvard.edu
 
 

10/06/14
New RIE-11 Plasma-Therm VersaLine Diamond RIE Going Online! Trainings to be announced soon!