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More Info: Equipment description and usage: Key High Vacuum TE-1 is a three-source thermal evaporation system for sequentially depositing thin films by resistive heating. Film thickness is monitored by a quartz crystal monitor. Base pressures down to 2e-7 torr are achievable by cryo and oil-free roughing pumps.
Applications: This tool is currently set up for general material depositions. Please contact staff-in-charge or primary user for the materials allowed in this system.
Features: * Three thermal source pockets and one power supply capable of sequential thin film deposition
* Quartz crystal monitor for closed loop thickness control
* Cryopump, base pressure down to ~ 10E-7 torr
Comments:
General Purpose
Contact Info:
Ed Macomber
LISE G44
11 Oxford Street
Cambridge, MA 02138
617-384-5227
eddiemaccns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
Ling Xie
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-496-9069
lxiecns.fas.harvard.edu
cns.fas.harvard.edu
