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NanoMaterials Facility
 Transparency Photomask Writer
CNS ID: SLF-4
MakeScreen USA
ModelPlateRite FX870II
CategoryChemical Nanotechnology
NameTransparency Photomask Writer
LocationLISE - G27
 
 
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PlateRite FX870II is a laser-based digital writer for writing dry-film transparency photmasks. It can output flexo digital plates, letterpress digital plates and thermal ablative film in any size from 4"x4" (100mmx100 mm) to 30"x34.2" (762mmx870 mm). The small 4"x4" format is perfect for writing low-resolution photomasks to expose 3" wafers. The minimum recommended feature size is 30um for square/rectangular patterns and 50um for rounded and oblique patterns. Typical writing time for a 4"x4" photomask is less than 5 minutes, not including the prep time. The whole photomask writing process can be completed in half an hour, giving the users unmatched flexibility for fast-prototyping of micro devices.
 
Contact Info:
Fettah Kosar
LISE G48
11 Oxford St.
Cambridge, MA 02138
617-495-1738
fkosarcns.fas.harvard.edu
Hao-Yu (Greg) Lin
LISE G40
11 Oxford Street
Cambridge, MA 02138
617-384-5028
hlincns.fas.harvard.edu
 
 

07/23/13
New DRIE on-line and available for Training !!

 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.

 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.

 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo

 

DRIE system on site - available soon.

 

01/18/13
i-line stepper coming to CNS this spring!

 

08/14/12
We bought the k-alpha XPS - it will be staying!

 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!

 

10/04/12
XeF2 etch system now available!

 

02/21/12
Time Resolved PL Spectroscopy now available