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Nanofabrication Facility
 XeF2 etcher
CNS ID: PAO-1
MakeHomemade
Model
CategoryDry Process
NameXeF2 etcher
LocationLISE - Cleanroom G07
 
 
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More Info
XeF2 etching is an isotropic process widely used for releasing MEMS structures including switches, cantilevers, bridges, mirrors, membranes, channels, and thermal isolation cavities. Its merits include highly selective etching, no stiction problems as existed with wet etching, and long under cuts. Shown in Fig. 1 is the homemade XeF2 etch system at CNS. In this system, a cycling process is applied in the following order: supplying high pressure N2 gas to XeF2 storage bottle flowing the mixture of XeF2 and N2 into the etch chamber  etching  pumping out vapor by-products  starting the next cycle. For safety concerns, the upper cabinet holds the etch chamber, the XeF2 bottle, and the gas lines and is vented to the acid exhaust pipe of the cleanroom. The cabinet normally is at a slightly lower pressure than the ambient. During process and stand-by modes, the cabinet doors are closed. At the end of every run, the etch chamber is pump-purged with N2 for 3 cycles to minimize harmful residuals.
Comments
Materials can be etched XeF2 is widely used to etch Si and it also etches Ge, Mo and SiGe as well as transitional metals W, Ti, Ta, TiN and TaN under certain conditions such as high temperatures. Materials that won’t be etched Following materials can’t be etched with the XeF2: Al, Ni, Cr, Pt, Ga, MgO, ZnO, AlN, GaAs, resist, and PDMS Etch Selectivity The etching selectivity of different materials to Si Materials Selectivity to Si Si 1:1 Mo 2:1 Ge ≥ 1:1 SiGe ≥ 1:1 Thermal SiO2 1:1000 CVD or PECVD SiO2 1:1000 Si3N4 >1:1000 Sample Sizes This system is able to handle sample sizes of 6” in diameter or smaller.
 
Contact Info:
Ling Xie
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-496-9069
lxiecns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
 
 

07/23/13
New DRIE on-line and available for Training !!

 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.

 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.

 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo

 

DRIE system on site - available soon.

 

01/18/13
i-line stepper coming to CNS this spring!

 

08/14/12
We bought the k-alpha XPS - it will be staying!

 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!

 

10/04/12
XeF2 etch system now available!

 

02/21/12
Time Resolved PL Spectroscopy now available