Nanofabrication Facility |
| Heidelberg uPG501 |
| CNS ID: MW-3 |
| Make: Heidelberg |
| Model: uPG501 |
| Category: Lithography |
| Name: Heidelberg uPG501 |
| Location: LISE - Cleanroom G07 |
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More Info:
The Heidelberg Instruments uPG501 is an optical direct-write lithography system. Using 390nm light and a micro-mirror array, the system can reproduce GDSII format CAD patterns directly on both positive tone and SU-8 photoresist. The system has a semi-automated alignment capability. Maximum resolution is 1 micron, though 2-3 micron is more typical. The system can accommodate substrates between 5 and 100 mm diameter, and between 100 microns and 7 mm thick, and can write on opaque, transparent, and reflective substrates. Writing speed is up to 44 mm2/min, depending greatly on the type and thickness of resist used. |
Comments:
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| Contact Info: |
Steven Hickman
LISE G38
11 Oxford Street
Cambridge, MA 02138
617-384-5024
shickman cns.fas.harvard.edu |
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu |
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