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NanoMaterials Facility
 Reflection Laser Scanning Confocal Microsope
CNS ID: MS-20
MakeZeiss
ModelLSM 310
CategoryAdvanced Optical Imaging
NameReflection Laser Scanning Confocal Microsope
LocationLISE - G27
 
 
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More Info
Zeiss LSM 310 with a 532 nm and 1064 nm laser lines for confocal microscopy in reflection mode. Silicon is transparent to 1064nm so buried structures can be imaged.
Comments
 
Contact Info:
Arthur McClelland
LISE G40
11 Oxford Street
Cambridge, MA 02138
617-496-8250
amcclellandcns.fas.harvard.edu
Fettah Kosar
LISE G48
11 Oxford St.
Cambridge, MA 02138
617-495-1738
fkosarcns.fas.harvard.edu
 
 

07/23/13
New DRIE on-line and available for Training !!

 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.

 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.

 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo

 

DRIE system on site - available soon.

 

01/18/13
i-line stepper coming to CNS this spring!

 

08/14/12
We bought the k-alpha XPS - it will be staying!

 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!

 

10/04/12
XeF2 etch system now available!

 

02/21/12
Time Resolved PL Spectroscopy now available