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This spin coater is shared by Soft Lithography Foundry and Nanoparticle Facility. It can be used for coating wafers or other substrates with polydimethylsiloxane (PDMS), photoresist, nanoparticle suspensions, and other CNS-approved materials. Its maximum speed is 10,000rpm
Please note that training is required prior to use of this tool.
Hao-Yu (Greg) Lin
11 Oxford Street
Cambridge, MA 02138
New RIE-11 Plasma-Therm VersaLine Diamond RIE Going Online! Trainings to be announced soon!