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NanoMaterials Facility
 Headway Spin Coater
CNS ID: SC-2
MakeHeadway
ModelPWM32
CategoryChemical Nanotechnology
NameHeadway Spin Coater
LocationLISE - G06
 
 
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More Info
This spin coater is shared by Soft Lithography Foundry and Nanoparticle Facility. It can be used for coating wafers or other substrates with polydimethylsiloxane (PDMS), photoresist, nanoparticle suspensions, and other CNS-approved materials. Its maximum speed is 10,000rpm
Comments
Please note that training is required prior to use of this tool.
 
Contact Info:
Hao-Yu (Greg) Lin
LISE G40
11 Oxford Street
Cambridge, MA 02138
617-384-5028
hlincns.fas.harvard.edu
 
 

10/06/14
New RIE-11 Plasma-Therm VersaLine Diamond RIE Going Online! Trainings to be announced soon!