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More Info:
This spin coater is shared by Soft Lithography Foundry and Nanoparticle Facility. It can be used for coating wafers or other substrates with polydimethylsiloxane (PDMS), photoresist, nanoparticle suspensions, and other CNS-approved materials. Its maximum speed is 10,000rpm
Comments:
Please note that training is required prior to use of this tool.
Contact Info:
Fettah Kosar
LISE G48
11 Oxford St.
Cambridge, MA 02138
617-495-1738
fkosarcns.fas.harvard.edu
Hao-Yu (Greg) Lin
LISE G40
11 Oxford Street
Cambridge, MA 02138
617-384-5028
hlincns.fas.harvard.edu