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Nanofabrication Facility
 Heidelberg Mask Writer
CNS ID: MW-1
MakeHeidelberg Inst.
ModelDWL-66
CategoryLithography
NameHeidelberg Mask Writer
LocationLISE - Cleanroom G07
 
 
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More Info
The Heidelberg DWL 66 is a high resolution, laser-based maskless optical lithography system, used at CNS for writing photomasks.

Detailed specifications include:
*Exposure laser: 405 nm diode
*Maximum resolution: 1 micron
*Maximum pattern extent: 140 x 140 mm
*4 inch and 5 inch soda-lime glass photomasks are stocked by CNS
*Accepts GDS format CAD files.
Comments
Training on the maskwriter is offered weekly, and sign up is via the CNS training webpage. Masks can also be ordered from CNS staff, with added charge for CNS remote staff assistance along with the hourly rate for the maskwriting tool. Requests for masks and Mask CAD files can be emailed to: shickman_AT_cns.fas.harvard.edu The necessary CAD file format for our mask writer is GDS format, produced by numerous software packages including LayoutEditor. All other CAD file formats will need to be converted to GDS format. DXF files can be converted to GDS format files via the program LinkCAD, available in the CNS basement computer lab. The CNS document SOP 123 explains how to perform this conversion. CNS staff can perform the conversion from DXF to GDS format. To have this done, please email the DXF file to shickman_AT_cns.fas.harvard.edu. Indicate the base unit used for the DXF drawing, make sure that all features are closed, and do not use the hatch option. Convert all text to polygons. Save files as compatible with Autocad 2000 or earlier. Note that staff conversion assistance is charged at the normal rate for assisted staff work, and is separate from any fees associated with the mask write itself. In addition to the CAD file, the following information must be submitted with the mask order: *minimum feature size *whether enclosed features should be opaque or transparent *size of the mask plate needed (the standard is 4 inch, soda-lime glass). *For GDS files, include the name of the top level cell, and the numbers of the data layer(s) to be written on the mask. *Convert all text objects and paths to polygons. Objects left as text or as paths, even paths with defined width, will not be written by the system. Writing time, and thus mask cost, is a function of the minimum feature size and the extent of the mask pattern.
 
Contact Info:
Amehayesus Gebreyohannes
LISE G50
11 Oxford Street
Cambridge, MA 02138
617-496-5466
amehacns.fas.harvard.edu
Guixiong Zhong
LISE G42
11 Oxford Street
Cambridge, MA 02138
617-384-5672
gzhongcns.fas.harvard.edu
Yuan Lu
LISE G42
11 Oxford Street
Cambridge, MA 02138
617-495-2822
ylufas.harvard.edu
 
 

10/06/14
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