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Nanofabrication Facility
 Raith-150 E-Beam
CNS ID: EL-1
MakeRaith
Model150
CategoryLithography
NameRaith-150 E-Beam
LocationLISE - Cleanroom G07
 
 
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More Info
Equipment description and usage:

The Raith 150 is an ultra-high resolution electron beam lithography system used for writing complex patterns in resists at resolutions of 50 nm for direct-write lithographic applications. The system also has a Scanning Electron Microscope to facilitate imaging and navigation of the sample.

Detailed specifications include:

Nanolithography:

* Direct write, wafer process development at sub-optical resolutions
* Filament type: Schottky Thermal Field Emission
* Selectable beam energy 200 V - 30 kV
* Probe current: 4 pA- 10nA
* Writing field: 1 micron - 800 micron
* Exposure step size: Write field/ 65536
* Resolution (PMMA <100 nm thick): 50 nm lines and 50 nm spaces
* Alignment accuracy (<100 um field): 60 nm
* Field stitching and mix and match accuracy: 60 nm (100 um fields).
* Writing speed: 10 MHz
* Sample handling: full 6" mask and wafer

Metrology:

* SEM inspection and sample navigation
* Image resolution:
2.0 nm @ 20 kV
4.0 nm @ 1 kV
Comments
Lithography/SEM Metrology
 
Contact Info:
Yuan Lu
LISE G42
11 Oxford Street
Cambridge, MA 02138
617-495-2822
ylufas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
 
 

07/23/13
New DRIE on-line and available for Training !!

 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.

 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.

 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo

 

DRIE system on site - available soon.

 

01/18/13
i-line stepper coming to CNS this spring!

 

08/14/12
We bought the k-alpha XPS - it will be staying!

 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!

 

10/04/12
XeF2 etch system now available!

 

02/21/12
Time Resolved PL Spectroscopy now available