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Nanofabrication Facility
 Tystar Bank2 TEOS Silicon Dioxide
CNS ID: CVD-11
Make: Tystar
Model: Mini Tytan 4600
Category: Furnaces
Name: Tystar Bank2 TEOS Silicon Dioxide
Location: LISE - Cleanroom G07
 
 
Click on a thumbnail to enlarge. For multiple images: after a picture has enlarged, you can move between photos by clicking on the right/left edges of the enlarged image.
More Info: 
This LPCVD TEOS Silicon Dioxide Furnace is a low pressure CVD furnace with a precursor vapor Tetra Ethyl Ortho Silicate, it is capable of processing wafer up to 6" and also smaller samples. Processing gases available are N2, O2 and TEOS.
Comments: 
Film thickness of 100nm 1 micron. Pressure 400 mtorr Temperature is 700 - 750'C Index of Refraction 1.42 - 1.47
 
Contact Info:
John Tsakirgis
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-384-9651
jtsakirgcns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
 
 

05/06/13
New Computational Cluster On-Line
 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.
 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.
 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo
 

DRIE system on site - available soon.
 

01/18/13
i-line stepper coming to CNS this spring!
 

08/14/12
We bought the k-alpha XPS - it will be staying!
 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!
 

10/04/12
XeF2 etch system now available!
 

02/21/12
Time Resolved PL Spectroscopy now available
 
 
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