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Nanofabrication Facility
 Tystar Bank2 TEOS Silicon Dioxide
CNS ID: CVD-11
MakeTystar
ModelMini Tytan 4600
CategoryFurnaces
NameTystar Bank2 TEOS Silicon Dioxide
LocationLISE - Cleanroom G07
 
 
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More Info
This LPCVD TEOS Silicon Dioxide Furnace is a low pressure CVD furnace with a precursor vapor Tetra Ethyl Ortho Silicate, it is capable of processing wafer up to 6" and also smaller samples. Processing gases available are N2, O2 and TEOS.
Comments
Film thickness of 100nm 1 micron. Pressure 400 mtorr Temperature is 700 - 750'C Index of Refraction 1.42 - 1.47
 
Contact Info:
Philippe de Rouffignac
LISE G38
11 Oxford Street
Cambridge, MA 02138
617-384-5695
philippecns.fas.harvard.edu
John Tsakirgis
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-384-9651
jtsakirgcns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
 
 

07/23/13
New DRIE on-line and available for Training !!

 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.

 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.

 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo

 

DRIE system on site - available soon.

 

01/18/13
i-line stepper coming to CNS this spring!

 

08/14/12
We bought the k-alpha XPS - it will be staying!

 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!

 

10/04/12
XeF2 etch system now available!

 

02/21/12
Time Resolved PL Spectroscopy now available