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More Info:
This furnace is for Thermal Oxidation and is an atmospheric furnace with an eighteen inch flat zone capable of processing wafers up to 6 inch diameter, as well as smaller samples as well. it also is equipped with an external Hydrogen torch for pyrogenic wet oxidation. There is also oxygen available for Dry oxidation and Nitrogen for anneals.
Comments:
Uniformity is 1.5% over 6" Index of Refraction is 1.45-1.47 rate is 7nm/min for Wet rate is 2.5nm/min for dry
Contact Info:
John Tsakirgis
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-384-9651
jtsakirgcns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
cns.fas.harvard.edu
