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Nanofabrication Facility
 Tystar Bank1 Low Temp Silicon Dioxide
CNS ID: CVD-8
MakeTystar
ModelMini Tytan 4600
CategoryFurnaces
NameTystar Bank1 Low Temp Silicon Dioxide
LocationLISE - Cleanroom G07
 
 
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More Info
The LPCVD TEOS Furnace is a low pressure CVD furnace with a 18" flat zone capable of processing up to 6" wafers and smaller samples as well. Process gases available are SiH4 and O2. Thickness to 1 micron Pressure 300 - 375 mtorr Temperature 375'C Index 1.44 - 1.47 Uniformity is 3% over 6".
Comments
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Contact Info:
Philippe de Rouffignac
LISE G38
11 Oxford Street
Cambridge, MA 02138
617-384-5695
philippecns.fas.harvard.edu
John Tsakirgis
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-384-9651
jtsakirgcns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
 
 

07/23/13
New DRIE on-line and available for Training !!

 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.

 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.

 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo

 

DRIE system on site - available soon.

 

01/18/13
i-line stepper coming to CNS this spring!

 

08/14/12
We bought the k-alpha XPS - it will be staying!

 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!

 

10/04/12
XeF2 etch system now available!

 

02/21/12
Time Resolved PL Spectroscopy now available