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Nanofabrication Facility
 Tystar Bank1 Polysilicon
CNS ID: CVD-7
Make: Tystar
Model: Mini Tytan 4600
Category: Furnaces
Name: Tystar Bank1 Polysilicon
Location: LISE - Cleanroom G07
 
 
Click on a thumbnail to enlarge. For multiple images: after a picture has enlarged, you can move between photos by clicking on the right/left edges of the enlarged image.
More Info: 
The LPCVD Polysilicon is a low pressure CVD furnace with 18" flat zone and capable of processing up to 6" wafers. Process gases available are SiH4, Ar/10% Phos and N2/10% Diborane for insitu doping.
Comments: 
Doped and undoped silicon films ranging from Poly to amorphous. Temps from 400'C to 670'C Process pressure 200 - 350 mtorr
 
Contact Info:
John Tsakirgis
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-384-9651
jtsakirgcns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
 
 

05/06/13
New Computational Cluster On-Line
 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.
 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.
 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo
 

DRIE system on site - available soon.
 

01/18/13
i-line stepper coming to CNS this spring!
 

08/14/12
We bought the k-alpha XPS - it will be staying!
 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!
 

10/04/12
XeF2 etch system now available!
 

02/21/12
Time Resolved PL Spectroscopy now available
 
 
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