Nanofabrication Facility |
| Solvent Based Photoresist Developer Station |
| CNS ID: SB-03 |
| Make: Reynolds Tech |
| Model: |
| Category: Wet Benches |
| Name: Solvent Based Photoresist Developer Station |
| Location: LISE - Cleanroom G07 |
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More Info:
SB-3 is a Reynolds Tech general purpose work station for solvent-based photoresist developing, particularly for photodefinable epoxies, located in the Photolithography Bay of the Center for Nanoscale Systems cleanroom. An ergonomic, anti-static, chemical spill mat is located in front of SB-3. The bench features a VWR shaker plate, a VWR stirring plate, gooseneck sinks, DI spray guns, N2 drying guns and solvent disposal drains. The touch screen interface displays warnings, alarms and error codes. Solvents are stocked beneath this bench for general use. |
Comments:
For training on this and all wet stations, sign-up at the Center for Nanoscale Systems training events web site www.cns.fas.harvard.edu/users/training_events.php
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| Contact Info: |
Steven Hickman
LISE G38
11 Oxford Street
Cambridge, MA 02138
617-384-5024
shickman cns.fas.harvard.edu |
Mac Hathaway
LISE G46
11 Oxford Street
Cambridge, MA 02138
617-495-9012
hathawaycns.fas.harvard.edu |
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