Nanofabrication Facility |
| RCA Clean Wet Process Station |
| CNS ID: AB-2 |
| Make: Reynolds Tech |
| Model: FWS 72CPVC |
| Category: Wet Benches |
| Name: RCA Clean Wet Process Station |
| Location: LISE - Cleanroom G07 |
| |
| |
|
| Click on a thumbnail to enlarge. For multiple images: after a picture has enlarged, you can move between photos by clicking on the right/left edges of the enlarged image. |
 |
|
More Info:
AB-2 is a Reynolds Tech RCA clean wet process station located in the Wet Process Bay of the Center for Nanoscale Systems cleanroom. All water supplied to this bench is 18 Mohm deionized water. An ergonomic, anti-static, chemical spill mat is located in front of AB-2. The bench features a 70C SC-1 bath, a 70C SC-2 bath and 25C DHF bath; each bath has an associated dump rinser and a there is a global plenum rinse. Bench top processing is permitted at this bench when the RCA clean tanks are not in use. There is a gooseneck sink, DI spray guns, aspirator and N2 drying guns. The touch screen interface allows for user control of dump rinser and aspirator timers, as well as displaying warnings, alarms and error codes. Acids and bases are stocked beneath this bench for general use. |
Comments:
For training on this and all wet stations, sign-up at the Center for Nanoscale Systems training events web site www.cns.fas.harvard.edu/users/training_events.php
|
| |
| Contact Info: |
John Tsakirgis
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-384-9651
jtsakirg cns.fas.harvard.edu |
Mac Hathaway
LISE G46
11 Oxford Street
Cambridge, MA 02138
617-495-9012
hathawaycns.fas.harvard.edu |
|
|
|
| |
|
| |
