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CNS Facilities
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Nanofabrication Facility
 Spin Rinse Dryer
CNS ID: SRD-1
Make: MicroProcess
Model: Avenger Ultra Pure 6
Category: Wet Benches
Name: Spin Rinse Dryer
Location: LISE - Cleanroom G07
 
 
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More Info: 
The spin rinse dryer is a MicroProcess two-stack system for 4"/100mm and 6"/150mm wafer rinsing and drying. All water supplied to this system is 18Mohm deionized water. The system employs in-line resistivity monitors to ensure adequate DI water rinsing of chemicals from a wafer and its cassette. Heated N2 is employed for wafer drying. All controls are from a simple touch screen interface.
Comments: 
 
Contact Info:
Steve Paolini
LISE G50
11 Oxford Street
Cambridge, MA 02138
617-496-9816
spaolinicns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
 
 

05/06/13
New Computational Cluster On-Line
 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.
 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.
 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo
 

DRIE system on site - available soon.
 

01/18/13
i-line stepper coming to CNS this spring!
 

08/14/12
We bought the k-alpha XPS - it will be staying!
 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!
 

10/04/12
XeF2 etch system now available!
 

02/21/12
Time Resolved PL Spectroscopy now available
 
 
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