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More Info:
Denton EE-4 is an electron beam deposition tool with a 6-position hearth capable of depositing nanoscale films of non-magnetic metals in a vacuum environment on the order of e-7 torr. EE-4 has a dual chamber design that affords the deposition materials to remain under vacuum during sample load-in. EE-4 can accommodate up to five 3" diameter wafers, or multiple small samples/pieces of wafers on rotating substrate holders. Substrate heating is available up to 200 degrees Celsius through quartz lamps. The sample chamber can be isolated to accommodate oxide processes. Depositions and pump-down/venting sequences are automated utilizing an onboard PLC that synchronizes these operations.
Comments:
The following materials are available for use in EE-4: Pt, Au, Pd, Ti, Ag, Ge
Contact Info:
Ed Macomber
LISE G44
11 Oxford Street
Cambridge, MA 02138
617-384-5227
eddiemaccns.fas.harvard.edu
Jason Tresback
LISE G46
11 Oxford Street
Cambridge, MA 02138
617-496-1783
jtresbackcns.fas.harvard.edu
cns.fas.harvard.edu
