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Nanofabrication Facility
 STS ICP RIE
CNS ID: RIE-8
MakeSurface Technology Systems
Model
CategoryDry Process
NameSTS ICP RIE
LocationLISE - Cleanroom G07
 
 
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More Info
Equipment:
The STS MPX/LPX RIE system is an Inductively Coupled Plasma Reactor that is used for Reactive Ion Etch. Using the ICP technology, this etch system is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity and low energy ion damage. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 5 to 30oC.

Applications:
The STS ICP RIE will be restricted to etch silicon-based materials, which include Si, SiO2, and Si3N4.

Features:
- ICP assembly upper electrode powered up to 1,500 W
- RF biased lower electrode powered up to 300 W and chilled to 4 to 30oC
- Single wafer loadlock up to 6" wafer
- Available gases: SF6, CHF3, CH4, H2, Cl2, HBr, BCl3, Ar, N2, O2, and N2
- Internet remote control capability

Processes:
Preliminary etching processes have been established for Si and Si3N4/SiO2/Si substrates. In general, the etching processes demonstrated smooth & clean etched surfaces, vertical side walls, high etch rate, and good selectivity to mask materials.

Training:
Please contact Dr. Ling Xie
lxie (at) cns.fas.harvard.edu.
Comments
 
Contact Info:
Ling Xie
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-496-9069
lxiecns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
 
 

07/23/13
New DRIE on-line and available for Training !!

 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.

 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.

 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo

 

DRIE system on site - available soon.

 

01/18/13
i-line stepper coming to CNS this spring!

 

08/14/12
We bought the k-alpha XPS - it will be staying!

 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!

 

10/04/12
XeF2 etch system now available!

 

02/21/12
Time Resolved PL Spectroscopy now available