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Nanofabrication Facility
 Suss MJB4 Mask Aligner
CNS ID: OL-5
MakeKarl Suss
ModelMJB4
CategoryLithography
NameSuss MJB4 Mask Aligner
LocationLISE - Cleanroom G07
 
 
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More Info
The MJB4 Mask Aligner allows different type of contact exposures (vacuum, hard, soft proximity contact) for different size sample (up to 4 inch in diameter). The achievable adjustment accuracy X, Y and theta is below 1 um. Masks and wafer/substrates to a total thickness of 9.00 mm can be processed. The MJB4 is equipped with 400 nm exposure optics and lamps that allow a sub-micro exposure in vacuum contact.
Comments
*Positive and negative tone photoresists *Substrate sizes up to 4 inches in diameter *4 inch or 5 inch mask plates *Topside alignment only *Minimum alignment mark separation for binocular vision: 3.5 cm *Typical pattern resolution 1 micrometer *Achievable alignment resolution 1 micrometer
 
Contact Info:
Amehayesus Gebreyohannes
LISE G50
11 Oxford Street
Cambridge, MA 02138

amehacns.fas.harvard.edu
Guixiong Zhong
LISE G42
11 Oxford Street
Cambridge, MA 02138
617-384-5672
gzhongcns.fas.harvard.edu
Ling Xie
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-496-9069
lxiecns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
 
 

07/23/13
New DRIE on-line and available for Training !!

 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.

 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.

 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo

 

DRIE system on site - available soon.

 

01/18/13
i-line stepper coming to CNS this spring!

 

08/14/12
We bought the k-alpha XPS - it will be staying!

 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!

 

10/04/12
XeF2 etch system now available!

 

02/21/12
Time Resolved PL Spectroscopy now available