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More Info:
The MJB4 Mask Aligner allows different type of contact exposures (vacuum, hard, soft proximity contact) for different size sample (up to 4 inch in diameter). The achievable adjustment accuracy X, Y and theta is below 1 um. Masks and wafer/substrates to a total thickness of 9.00 mm can be processed. The MJB4 is equipped with 400 nm exposure optics and lamps that allow a sub-micro exposure in vacuum contact.
Comments:
*Positive and negative tone photoresists
*Substrate sizes up to 4 inches in diameter
*4 inch or 5 inch mask plates
*Topside alignment only
*Minimum alignment mark separation for binocular vision: 3.5 cm
*Typical pattern resolution 1 micrometer
*Achievable alignment resolution 1 micrometer
Contact Info:
Steven Hickman
LISE G38
11 Oxford Street
Cambridge, MA 02138
617-384-5024
shickmancns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
cns.fas.harvard.edu
