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Nanofabrication Facility
 FLX-2320-S Thin Film Stress Measurement
CNS ID: MET-1
MakeToho
ModelFLX-2320-S
CategoryMetrology
NameFLX-2320-S Thin Film Stress Measurement
LocationLISE - Cleanroom G07
 
 
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More Info
The FLX-2320-S determines stress by measuring the curvature change of pre- and post- film deposition. It can measure film stress from -65ºC to 500ºC at a heating rate up to 30ºC/min. Stress variation with temperature is able to be used to characterize film properties, such as moisture concentration, phase changes, thermal expansion, volume changes, and plastic deformations.



Other characteristics of the instrument include:
• Dual wave lengths
• Calculation of biaxial modules of elasticity, linear expansion
coefficient, stress uniformity and file subtraction
• Calculation of water diffusion coefficient
• 2-D and 3-D view of wafer topography
• Wafer size: 75 - 200 mm
• Measurement temperature: from -65ºC to 500ºC
• PC base controller
• Speed: 5 sec for 150 mm wafer
• Minimum scan step: 0.02 mm
• Maximum points per scan: 1250
Comments
 
Contact Info:
Jason Tresback
LISE G46
11 Oxford Street
Cambridge, MA 02138
617-496-1783
jtresbackcns.fas.harvard.edu
Ling Xie
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-496-9069
lxiecns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
 
 

07/23/13
New DRIE on-line and available for Training !!

 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.

 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.

 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo

 

DRIE system on site - available soon.

 

01/18/13
i-line stepper coming to CNS this spring!

 

08/14/12
We bought the k-alpha XPS - it will be staying!

 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!

 

10/04/12
XeF2 etch system now available!

 

02/21/12
Time Resolved PL Spectroscopy now available