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More Info:
The NVision 40 Dual-Beam focused ion beam and scanning electron microscope is available to perform direct etching and milling of patterns. In addition, metal or oxide pattern deposition can be performed. The Raith lithography package allows advanced patterning, milling and deposition. An Omniprobe mechanical probe permits the lift-out of TEM specimens. An EDAX energy dispersive x-ray spectrometer allows the user to determine the chemical composition of the specimen. Both heating and cooling (cryo) stages are available for use. Please contact fkosar@cns.fas.harvard.edu for additional information.
Please note that reservations for use of this facility cannot be deleted or modified within 4 hours of the scheduled start time. If you cannot make it for a scheduled time and it is within 4 hours of the start time, you will need to contact the CNS Admin. Office to cancel/modify the reservation.
Comments: Previous SEM experience or CNS SEM certification required as prerequisite to NVision training.
Contact Info:
Nicholas Antoniou
LISE B56
11 Oxford Street
Cambridge, MA 02138
617-496-9682
nicholascns.fas.harvard.edu
Fettah Kosar
LISE G48
11 Oxford St.
Cambridge, MA 02138
617-495-1738
fkosarcns.fas.harvard.edu
cns.fas.harvard.edu
