Nanofabrication Facility |
| SUSS MA6 Mask Aligner |
| CNS ID: OL-4 |
| Make: SUSS |
| Model: MA6 |
| Category: Lithography |
| Name: SUSS MA6 Mask Aligner |
| Location: LISE - Cleanroom G07 |
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More Info:
The SUSS MA6 Mask Aligner is the highest resolution contact mask aligner available at the CNS, with sub-micron feature capability in positive tone resists. In addition to the highly accurate topside alignment capability, the MA6 can perform front-to-backside alignment with the use of a second alignment microscope. |
Comments:
Major functions, features, and benefits:
*Topside(TSA) and Backside(BSA) alignment
*Achievable exposure resolution 0.6 um, alignment resolution better than 1um
*Maximum substrate size 6"
*Able to perform soft, hard, low vacuum and vacuum contact, as well as proximity exposure
*Restricted to positive-tone photoresists
*Minimum alignment mark separation for binocular vision: 5 cm
*Training is offered on-demand, typically after users have been trained on the MJB4 mask aligner.
Contact shickman_at_cns.fas.harvard.edu for more information.
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| Contact Info: |
Steven Hickman
LISE G38
11 Oxford Street
Cambridge, MA 02138
617-384-5024
shickman cns.fas.harvard.edu |
Ling Xie
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-496-9069
lxiecns.fas.harvard.edu |
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu |
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