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More Info:
The MJB3 mask aligner can resolve features to a few microns, on substrates up to 3 inches in diameter. The tool is restricted to positive tone resists. The tool can produce alignment accuracy of a few microns. The monocular alignment microscope makes rotational alignment more challenging than on the other mask aligners, however, some users find it easier to use when aligning small samples.
The system has 3 available contact modes: soft, hard, and vacuum.
Primary training on the tool is offered most Thursdays as a component of the “Introduction to photolithography” training.
Comments:
*Positive tone photoresists only
*Substrate sizes up to 3 inches in diameter
*4 inch mask plates
*Topside alignment only
*Typical pattern resolution ~3-5 micrometers
*Achievable alignment resolution ~2 micrometers
Contact Info:
Steven Hickman
LISE G38
11 Oxford Street
Cambridge, MA 02138
617-384-5024
shickmancns.fas.harvard.edu
Ling Xie
LISE G52
11 Oxford Street
Cambridge, MA 02138
617-496-9069
lxiecns.fas.harvard.edu
Jiangdong Deng
LISE G54
11 Oxford Street
Cambridge, MA 02138
617-495-3396
jdengcns.fas.harvard.edu
cns.fas.harvard.edu
