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CNS Facilities
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» NanoMaterials Facility
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Nanofabrication Facility
 

The Center for Nanoscale Systems' Nanofabrication Facility (CNS-NF), provides resource and staff support for fabricating and characterizing nanoscale devices and structures.

The facility currently operates the 10,000sq.ft. LISE Cleanroom with leading-edge equipment capable of electron-beam and optical lithography, physical and chemical vapor deposition, dry and wet processing, metrology, and device characterization.

For more information on available equipment, their capabilities, and the staff member in responsible for them, see the "Available Tools" below.

As one of the sites in the NSF funded National Nanotechnology Infrastructure Network (NNIN), the facility is also open to outside academia and industry users.

A dedicated staff team is always ready to support our users. You are encouraged to contact us directly if you have questions, concerns and suggestions about our facility, or needs in technical assistance.

Select Tool Category:
Available Tools
 
Back-End and Characterization
CNS ID Tool Name
FCB-1 Finetech Flip Chip Bonder
PB-1 Signatone Probe Station
PB-2 Lakeshore 1.5K Probe Station
SW-2 LSD-100 Scriber/Cleaver
SW-3 Fusion Splicer
WB-1 Wire Bonder
 
Chemical Vapor Deposition
CNS ID Tool Name
ALD-1 Savannah Atomic Layer Deposition
ALD-2 GEMStar ALD and Pulsed CVD
CVD-13 PECVD; Diamond
CVD-2 Nexx PECVD
CVD-3 STS PECVD
 
Dry Process
CNS ID Tool Name
PAO-1 XeF2 etcher
RIE-1 South Bay RIE
RIE-10 SPTS Rapier DRIE
RIE-4 Samco UV & Ozone Stripper
RIE-5 Technics Plasma Stripper/Cleaner
RIE-6 Nexx RIE
RIE-7 Unaxis Shuttleline ICP RIE
RIE-8 STS ICP RIE
RIE-9 Anatech Barrel Plasma System
 
Furnaces
CNS ID Tool Name
CVD-10 Tystar Bank2 Wet/Dry Oxidation
CVD-11 Tystar Bank2 TEOS Silicon Dioxide
CVD-4 Lindberg Furnace
CVD-5 Tystar Bank1 Non-Metal Anneal
CVD-6 Tystar Bank1 Silicon Nitride
CVD-7 Tystar Bank1 Polysilicon
CVD-8 Tystar Bank1 Low Temp Silicon Dioxide
CVD-9 Tystar Bank2 Metal Anneal
RTP-1 Jipelec Rapid Thermal Processor
RTP-2 Rapid Thermal Processor
 
Lithography
CNS ID Tool Name
EL-1 Raith-150 E-Beam
EL-3 JEOL JSM-7000F
EL-4 Elionix ELS-7000
EL-5 Elionix ELS-F125
HPT-2 Hot Plate Tower 2
HPT-3 Hot Plate Tower 3
MW-1 Heidelberg Mask Writer
MW-3 Heidelberg uPG501
OL-3 Suss MJB3 Mask Aligner
OL-4 SUSS MA6 Mask Aligner
OL-5 Suss MJB4 Mask Aligner
OL-7 AS200 i-line Stepper
WS-02 Layout BEAMER/LAB software
 
Materials Preparation
CNS ID Tool Name
CD-2 Critical Point Dryer
 
Metrology
CNS ID Tool Name
CE-1 Characterization Electronics
CE-2 Agilent B1500 Semiconductor Analyzer
ES-1 Woollam Spectroscopic Ellipsometer
ES-2 Scanning Ellipsometer
MET-1 FLX-2320-S Thin Film Stress Measurement
MET-12 Quantox Non-contact electrical measurement
MET-13 LED Measurement System and Integrating Sphere
MET-2 CDE ResMap-178
MET-5 Hall Effect Measurement System
MS-16 Olympus microscope
PL-3 Veeco Dektak Profilometer
PL-5 Veeco Dektak Profilometer
PL-6 CCI HD Optical Profiler
SPM-5 Veeco NanoMan AFM
 
Physical Vapor Deposition
CNS ID Tool Name
EE-2 Edwards E-Beam Evaporator
EE-3 Sharon E-Beam Evaporator
EE-4 Denton E-Beam Evaporator
SP-2 Sputtering System - 6 target
SP-3 Sputtering System - 3 target
TE-1 Key High Thermal Evaporator
TE-3 Sharon Thermal Evaporator TE-3
TE-4 Sharon Thermal Evaporator TE-4
TE-5 Sharon Thermal Evaporator TE-5
 
Wet Benches
CNS ID Tool Name
AB-1 General Wet Process Station
AB-2 RCA Clean Wet Process Station
AB-3 Photoresist Developer Station
SB-01 Metal Lift-Off Processing Station
SB-02 Solvent Processing Station
SB-03 Solvent Based Photoresist Developer Station
SB-04 Positive/Negative Photoresist Station
SB-05 SU-8 Spin Coating Station
SB-06 Electron Beam Resist Developing Station
SB-07 Electron Beam Resist Spin Coating Station
SRD-1 Spin Rinse Dryer
 
Wet Process
CNS ID Tool Name
CD-1 Critical-Point Dryer
 
 

07/23/13
New DRIE on-line and available for Training !!

 

05/02/13
LED Measurement System and Integrating Sphere now available! Contact Jason Tresback for training.

 

03/12/13
Quantox non-contact electrical measurement tool commissioned. See Philippe for training.

 

02/20/13
Olympus Total Internal Reflection Fluorescence Microscopy Hands-On Demo

 

DRIE system on site - available soon.

 

01/18/13
i-line stepper coming to CNS this spring!

 

08/14/12
We bought the k-alpha XPS - it will be staying!

 

05/14/12
We bought the Heidelberg uPG501 direct write system - it will be staying!

 

10/04/12
XeF2 etch system now available!

 

02/21/12
Time Resolved PL Spectroscopy now available